通过共聚焦显微X射线荧光光谱法对多层薄膜厚度均匀性进行原位和元素分辨测定。

In-situ and elementally resolved determination of the thickness uniformity of multi-ply films by confocal micro XRF.

作者信息

Peng Song, Liu Zhiguo, Sun Tianxi, Wang Guangfu, Ma Yongzhong, Ding Xunliang

机构信息

The Key Laboratory of Beam Technology and Materials Modification of the Ministry of Education, Beijing Normal University, Beijing 100875, China; College of Nuclear Science and Technology, Beijing Normal University, Beijing 100875, China; Beijing Radiation Center, Beijing 100875, China.

出版信息

Appl Radiat Isot. 2014 Aug;90:84-8. doi: 10.1016/j.apradiso.2014.03.019. Epub 2014 Mar 26.

DOI:10.1016/j.apradiso.2014.03.019

PMID:24705010

Abstract

Confocal micro X-ray fluorescence (CM-XRF) with quasi-monochromatic excitation based on polycapillary X-ray optics was used to measure the thickness of multi-ply films. The relative errors of measuring an Fe film with a thickness of 16.3 μm and a Cu film with a thickness of 24.5 μm were 7.3% and 0.4%, respectively. The non-destructive and in-situ measurement of the thickness and uniformity of multi-ply films of Cu, Fe and Ni on a silicon surface was performed. CM-XRF was convenient in in-situ and elementally resolved analysis of the thickness of multi-ply films without a cumbersome theoretical correction model.

摘要

基于聚束毛细管X射线光学的准单色激发共聚焦微X射线荧光（CM-XRF）被用于测量多层膜的厚度。测量厚度为16.3μm的铁膜和厚度为24.5μm的铜膜时，相对误差分别为7.3%和0.4%。对硅表面上铜、铁和镍的多层膜厚度及均匀性进行了无损原位测量。CM-XRF便于对多层膜厚度进行原位和元素分辨分析，无需繁琐的理论校正模型。