[New acrylic resins with very low residual monomer].

New experimental acrylic resins were prepared by polymerization of MMA in the presence of vinylidene fluoride/hexafluoropropylene copolymer. The amount of residual monomer in the resins prepared by visible light curing, cold curing, and heat curing, at various polymer/monomer ratios, was measured and compared with the usual MMA/PMMA resin. In the visible light cured resins containing 60 or 70 wt% of the fluoropolymer, the amount of residual monomer was less than 0.1%. In the cold cured resins, the amount of residual monomer was very low: 0.2% and 0.7% for the resins containing 70 and 60 wt% of the polymer, respectively. These values were comparable to the usual heat cured MMA/PMMA resins. In the heat cured resins, the amount of residual monomer was the lowest; less than 0.1%, even in the resin consisting of 50 wt% polymer. Thus, we prepared new acrylic resins with much less residual monomer than the usual MMA/PMMA resins.