Soğancı Gökçe, Yazıcıoğlu Hüseyin
Cleft Palate Craniofac J. 2016 Jan;53(1):73-83. doi: 10.1597/13-248. Epub 2014 Jun 11.
Mini dental implants could be an alternative treatment method for prosthetic treatment of edentulous cleft palate. The aim of this study was to analyze stress distribution around the cortical bone and different plans using a varied number of mini dental implants in edentulous unilateral complete cleft palates.
Three edentulous maxillary models were modified to create unilateral complete cleft palates. Mini dental implants (2.4 × 15 mm) were located as two mini implants at the premolar region, four mini implants at the premolar and molar region, and six mini implants at the first premolar, second premolar, and first molar regions in the models, respectively. Mucosa, o-ring/ball attachments, and overdentures were simulated. Vertical and horizontal loads of 100 N were applied on both the right and left molar teeth of the overdenture for each model. Maximum and minimum principal stress values and the distribution at cortical bone around the implants and cleft palates were evaluated by finite element analysis.
Stress values under vertical loads were lower than values under horizontal loadings for all models. Stress values were found to be lower in the first model than in the second and third models. The highest stress values were found around implants in the second model. The unilateral feature of a complete cleft pattern affected the stress distribution.
Stresses occured mostly around implants when the overdenture was supported by six implants; however, the stress distribution around implants was low with two implants because of tissue support.
微型牙种植体可能是无牙裂腭修复治疗的一种替代治疗方法。本研究的目的是分析在单侧完全性无牙裂腭中使用不同数量的微型牙种植体时皮质骨周围的应力分布以及不同方案。
对三个无牙上颌模型进行修改以创建单侧完全性腭裂。在模型中,微型牙种植体(2.4×15mm)分别位于前磨牙区的两个微型种植体、前磨牙和磨牙区的四个微型种植体以及第一前磨牙、第二前磨牙和第一磨牙区的六个微型种植体处。模拟黏膜、O形环/球附着体和覆盖义齿。对每个模型的覆盖义齿的左右磨牙施加100N的垂直和水平载荷。通过有限元分析评估种植体和腭裂周围皮质骨的最大和最小主应力值及其分布。
所有模型在垂直载荷下的应力值均低于水平载荷下的应力值。发现第一个模型中的应力值低于第二个和第三个模型。在第二个模型中,种植体周围的应力值最高。完全性腭裂模式的单侧特征影响了应力分布。
当覆盖义齿由六个种植体支撑时,应力主要出现在种植体周围;然而,由于组织支撑,两个种植体时种植体周围的应力分布较低。