Technische Universität Braunschweig, Institut für Hochfrequenztechnik, Schleinitzstraße 22, Braunschweig 38106, Germany.
SENTECH Instruments GmbH, Schwarzschildstraße 2, Berlin 12489, Germany.
Nanoscale Res Lett. 2014 May 7;9(1):223. doi: 10.1186/1556-276X-9-223. eCollection 2014.
A widely used application of the atomic layer deposition (ALD) and chemical vapour deposition (CVD) methods is the preparation of permeation barrier layers against water vapour. Especially in the field of organic electronics, these films are highly demanded as such devices are very sensitive to moisture and oxygen. In this work, multilayers of aluminium oxide (AlO x ) and plasma polymer (PP) were coated on polyethylene naphthalate substrates by plasma-enhanced ALD and plasma-enhanced CVD at 80â"ƒ in the same reactor, respectively. As precursor, trimethylaluminium was used together with oxygen radicals in order to prepare AlO x , and benzene served as precursor to deposit the PP. This hybrid structure allows the decoupling of defects between the single AlO x layers and extends the permeation path for water molecules towards the entire barrier film. Furthermore, the combination of two plasma techniques in a single reactor system enables short process times without vacuum breaks. Single aluminium oxide films by plasma-enhanced ALD were compared to thermally grown layers and showed a significantly better barrier performance. The water vapour transmission rate (WVTR) was determined by means of electrical calcium tests. For a multilayer with 3.5 dyads of 25-nm AlO x and 125-nm PP, a WVTR of 1.2 × 10 (-3) gm (-2) d (-1) at 60â"ƒ and 90% relative humidity could be observed.
原子层沉积 (ALD) 和化学气相沉积 (CVD) 方法的一个广泛应用是制备水蒸气渗透阻挡层。特别是在有机电子领域，这些薄膜的需求非常高，因为这些器件对水分和氧气非常敏感。在这项工作中，分别通过等离子体增强 ALD 和等离子体增强 CVD 在相同的反应器中于 80℃下在聚萘二甲酸乙二醇酯衬底上沉积氧化铝 (AlO x ) 和等离子体聚合物 (PP) 的多层。作为前体，三甲基铝与氧自由基一起用于制备 AlO x ，苯用作沉积 PP 的前体。这种混合结构允许解耦单层 AlO x 层之间的缺陷，并延长水分子渗透到整个阻挡膜的路径。此外，两种等离子体技术在单个反应器系统中的结合可以实现短的处理时间，而无需中断真空。通过等离子体增强 ALD 制备的单层氧化铝与热生长层进行了比较，显示出明显更好的阻挡性能。水蒸气透过率 (WVTR) 通过电钙测试来确定。对于具有 3.5 个 25nm AlO x 和 125nm PP 偶联的多层结构，在 60℃和 90%相对湿度下可以观察到 1.2×10(-3)gm(-2)d(-1)的 WVTR。
