氧化石墨烯和还原氧化石墨烯的分散行为。
Dispersion behaviour of graphene oxide and reduced graphene oxide.
作者信息
Konios Dimitrios, Stylianakis Minas M, Stratakis Emmanuel, Kymakis Emmanuel
机构信息
Center of Materials Technology and Photonics & Electrical Engineering Department, School of Engineering, Technological Educational Institute (TEI) of Crete, Heraklion 71004, Crete, Greece; Department of Chemistry, University of Crete, P.O. Box 2208, Heraklion 71003, Crete, Greece.
Institute of Electronic Structure and Laser (IESL), Foundation for Research and Technology-Hellas (FORTH), Heraklion 71110, Crete, Greece.
出版信息
J Colloid Interface Sci. 2014 Sep 15;430:108-12. doi: 10.1016/j.jcis.2014.05.033. Epub 2014 Jun 2.
The dispersion behaviour of graphene oxide (GO) and chemically reduced GO (rGO) has been investigated in a wide range of organic solvents. The effect of the reduction process on the GO solubility in eighteen different solvents was examined and analysed, taking into consideration the solvent polarity, the surface tension and the Hansen and Hildebrand solubility parameters. rGO concentrations up to ∼9 μg/mL in chlorinated solvents were achieved, demonstrating an efficient solubilization strategy, extending the scope for scalable liquid-phase processing of conductive rGO inks for the development of printed flexible electronics.
已在多种有机溶剂中研究了氧化石墨烯（GO）和化学还原氧化石墨烯（rGO）的分散行为。考虑到溶剂极性、表面张力以及汉森和希尔德布兰德溶解度参数，研究并分析了还原过程对GO在18种不同溶剂中溶解度的影响。在氯化溶剂中实现了高达约9μg/mL的rGO浓度，这证明了一种有效的增溶策略，拓展了用于印刷柔性电子产品开发的导电rGO油墨可扩展液相加工的范围。
Zotero 插件