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体绝缘Bi(2)Se(3)薄膜中解耦表面传输通道的出现。

Emergence of decoupled surface transport channels in bulk insulating Bi(2)Se(3) thin films.

作者信息

Brahlek Matthew, Koirala Nikesh, Salehi Maryam, Bansal Namrata, Oh Seongshik

机构信息

Department of Physics and Astronomy, Rutgers, The State University of New Jersey, Piscataway, New Jersey 08854, USA.

Deparment of Materials Science and Engineering, Rutgers, The State University of New Jersey, Piscataway, New Jersey 08854, USA.

出版信息

Phys Rev Lett. 2014 Jul 11;113(2):026801. doi: 10.1103/PhysRevLett.113.026801. Epub 2014 Jul 7.

Abstract

In ideal topological insulator (TI) films the bulk state, which is supposed to be insulating, should not provide any electric coupling between the two metallic surfaces. However, transport studies on existing TI films show that the topological states on opposite surfaces are electrically tied to each other at thicknesses far greater than the direct coupling limit where the surface wave functions overlap. Here, we show that as the conducting bulk channels are suppressed, the parasitic coupling effect diminishes, and the decoupled surface channels emerge as expected for ideal TIs. In Bi(2)Se(3) thin films with fully suppressed bulk states, the two surfaces, which are directly coupled below ∼10  QL, become gradually isolated with increasing thickness and are completely decoupled beyond ∼20  QL. On such a platform, it is now feasible to implement transport devices whose functionality relies on accessing the individual surface layers without any deleterious coupling effects.

摘要

在理想的拓扑绝缘体(TI)薄膜中,本应绝缘的体态不应在两个金属表面之间提供任何电耦合。然而,对现有TI薄膜的输运研究表明,在厚度远大于表面波函数重叠的直接耦合极限时,相对表面上的拓扑态彼此电连接。在此,我们表明,随着导电的体通道被抑制,寄生耦合效应减弱,解耦的表面通道如理想TI所预期的那样出现。在体态完全被抑制的Bi(2)Se(3)薄膜中,在低于约10个量子层(QL)时直接耦合的两个表面,随着厚度增加逐渐隔离,在超过约20个QL时完全解耦。在这样一个平台上,现在可以实现功能依赖于访问单个表面层而没有任何有害耦合效应的输运器件。

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