Gajewski Krzysztof, Kopiec Daniel, Moczała Magdalena, Piotrowicz Adam, Zielony Michał, Wielgoszewski Grzegorz, Gotszalk Teodor, Strupiński Włodek
Wrocław University of Technology, Faculty of Microsystem Electronics and Photonics, ul. Z. Janiszewskiego 11/17, PL-50372 Wrocław, Poland.
Wrocław University of Technology, Faculty of Microsystem Electronics and Photonics, ul. Z. Janiszewskiego 11/17, PL-50372 Wrocław, Poland.
Micron. 2015 Jan;68:17-22. doi: 10.1016/j.micron.2014.08.005. Epub 2014 Aug 20.
Sublimated graphene grown on SiC is an attractive material for scientific investigations. Nevertheless the self limiting process on the Si face and its sensitivity to the surface quality of the SiC substrates may be unfavourable for later microelectronic processes. On the other hand, chemical vapor deposited (CVD) graphene does not posses such disadvantages, so further experimental investigation is needed. In this paper CVD grown graphene on 6H-SiC (0001) substrate was investigated using scanning probe microscopy (SPM). Electrical properties of graphene were characterized with the use of: scanning tunnelling microscopy, conductive atomic force microscopy (C-AFM) with locally performed C-AFM current-voltage measurements and Kelvin probe force microscopy (KPFM). Based on the contact potential difference data from the KPFM measurements, the work function of graphene was estimated. We observed conductance variations not only on structural edges, existing surface corrugations or accidental bilayers, but also on a flat graphene surface.
在碳化硅(SiC)上生长的升华石墨烯是科学研究中一种有吸引力的材料。然而,在Si面上的自限制过程及其对SiC衬底表面质量的敏感性可能对后续的微电子工艺不利。另一方面,化学气相沉积(CVD)石墨烯不存在这些缺点,因此需要进一步的实验研究。本文利用扫描探针显微镜(SPM)对在6H-SiC(0001)衬底上通过CVD生长的石墨烯进行了研究。石墨烯的电学性质通过以下方法进行表征:扫描隧道显微镜、具有局部进行的C-AFM电流-电压测量的导电原子力显微镜(C-AFM)以及开尔文探针力显微镜(KPFM)。基于KPFM测量得到的接触电势差数据,估算了石墨烯的功函数。我们不仅在结构边缘、现有的表面波纹或偶然的双层上观察到了电导变化,而且在平坦的石墨烯表面上也观察到了电导变化。