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UV/H2O2 预氧化对氯化过程中卤乙酰胺和其他含氮消毒副产物形成的影响。

Impact of UV/H2O2 pre-oxidation on the formation of haloacetamides and other nitrogenous disinfection byproducts during chlorination.

机构信息

State Key Laboratory of Pollution Control and Resources Reuse, College of Environmental Science and Engineering, Tongji University , Shanghai, 200092, China.

出版信息

Environ Sci Technol. 2014 Oct 21;48(20):12190-8. doi: 10.1021/es502115x. Epub 2014 Oct 2.

DOI:10.1021/es502115x
PMID:25251305
Abstract

Haloacetamides (HAcAms), an emerging class of nitrogen-based disinfection byproducts (N-DBPs) of health concern in drinking water, have been found in drinking waters at μg/L levels. However, there is a limited understanding about the formation, speciation, and control of halogenated HAcAms. Higher ultraviolet (UV) doses and UV advanced oxidation (UV/H2O2) processes (AOPs) are under consideration for the treatment of trace organic pollutants. The objective of this study was to examine the potential of pretreatment with UV irradiation, H2O2 oxidation, and a UV/H2O2 AOP for minimizing the formation of HAcAms, as well as other emerging N-DBPs, during postchlorination. We investigated changes in HAcAm formation and speciation attributed to UV, H2O2 or UV/H2O2 followed by the application of free chlorine to quench any excess hydrogen peroxide and to provide residual disinfection. The results showed that low-pressure UV irradiation alone (19.5-585 mJ/cm(2)) and H2O2 preoxidation alone (2-20 mg/L) did not significantly change total HAcAm formation during subsequent chlorination. However, H2O2 preoxidation alone resulted in diiodoacetamide formation in two iodide-containing waters and increased bromine utilization. Alternatively, UV/H2O2 preoxidation using UV (585 mJ/cm(2)) and H2O2 (10 mg/L) doses typically employed for trace contaminant removal controlled the formation of HAcAms and several other N-DBPs in drinking water.

摘要

卤乙酰胺(HAcAms)作为一类新兴的氮基饮用水消毒副产物(N-DBPs),其浓度通常在微克/升水平,对健康存在潜在威胁,已在饮用水中被检出。然而,对于卤代 HAcAms 的形成、形态和控制,人们的了解还很有限。更高剂量的紫外线(UV)和紫外线高级氧化(UV/H2O2)工艺(AOPs)正被考虑用于处理痕量有机污染物。本研究的目的是考察 UV 辐照、H2O2 氧化和 UV/H2O2 AOP 预处理对减少加氯后 HAcAms 及其他新兴 N-DBPs 形成的潜力。我们研究了归因于 UV、H2O2 或 UV/H2O2 的 HAcAm 形成和形态变化,随后应用自由氯来淬灭任何过量的过氧化氢,并提供剩余的消毒。结果表明,单独的低压 UV 辐照(19.5-585 mJ/cm2)和单独的 H2O2 预氧化(2-20 mg/L)在随后的氯化过程中并没有显著改变总 HAcAm 的形成。然而,单独的 H2O2 预氧化导致两种含碘水中二碘乙酰胺的形成,并增加了溴的利用率。相比之下,通常用于去除痕量污染物的 UV(585 mJ/cm2)和 H2O2(10 mg/L)剂量的 UV/H2O2 预氧化控制了饮用水中 HAcAms 和其他几种 N-DBPs 的形成。

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