Nguyen Ba-Son, Lin Jen-Fin, Perng Dung-Ching
Department of Mechanical Engineering, ‡Center for Micro/Nano Science and Technology, and §Institute of Microelectronics and Electrical Engineering Department, National Cheng Kung University , 1 University Road, Tainan 701, Taiwan.
ACS Appl Mater Interfaces. 2014 Nov 26;6(22):19566-73. doi: 10.1021/am5033154. Epub 2014 Nov 10.
Three kinds of graphene/polyimide specimen were prepared via transfer with 3, 6, and 9 graphene layers, respectively. A self-designed bending tester was applied to carry out cyclic bending tests with various bending cycles and bending frequencies. The variations of electrical resistance of the specimens during the bending process and the rate of increase of electrical resistance with the number of bending cycles and bending frequency for various total graphene thicknesses were determined. The voids that form at the interfaces between any two adjacent layers increase in size, leading to a disconnection between graphene layers after a number of bending cycles. A reduction in the graphene thickness and increases in the number of bending cycles and bending frequency increase the rate of increase of electrical resistance. For specimens with a given graphene thickness, the ID/IG value of the Raman shift increases exponentially with increasing number of bending cycles and bending frequency. An increase in ID/IG is accompanied by increases in both the rate of increase of electrical resistance and the aspect ratio L1/L2 (where L1 and L2 are the half lengths of the long and short axes, respectively, of the selected-area electron diffraction pattern of graphene). The tilt angle formed in the top graphene layer of the specimen after bending tests increases with increasing graphene thickness for a given bending frequency. The rate of increase of the tilt angle is affected by the bending frequency.
分别通过转移具有3、6和9个石墨烯层制备了三种石墨烯/聚酰亚胺样品。应用自行设计的弯曲测试仪进行不同弯曲循环次数和弯曲频率的循环弯曲试验。确定了样品在弯曲过程中电阻的变化以及不同总石墨烯厚度下电阻随弯曲循环次数和弯曲频率的增加速率。在任意两个相邻层之间的界面处形成的空隙尺寸增大,导致在多次弯曲循环后石墨烯层之间断开连接。石墨烯厚度的减小以及弯曲循环次数和弯曲频率的增加会提高电阻的增加速率。对于具有给定石墨烯厚度的样品,拉曼位移的ID/IG值随弯曲循环次数和弯曲频率的增加呈指数增加。ID/IG的增加伴随着电阻增加速率和纵横比L1/L2(其中L1和L2分别是石墨烯选区电子衍射图案的长轴和短轴的半长)的增加。对于给定的弯曲频率,弯曲试验后样品顶部石墨烯层中形成的倾斜角随石墨烯厚度的增加而增大。倾斜角的增加速率受弯曲频率的影响。