Xu Lin, Chen Huanyang
College of Physics, Optoelectronics and Energy, Soochow University, Suzhou 215006, the People's Republic of China.
Sci Rep. 2014 Oct 31;4:6862. doi: 10.1038/srep06862.
Over the past years, invisibility cloaks have been extensively discussed since transformation optics emerges. Generally, the electromagnetic parameters of invisibility cloaks are complicated tensors, yet difficult to realize. As a special method of transformation optics, conformal mapping helps us design invisibility cloak with isotropic materials of a refractive index distribution. However, for all proposed isotropic cloaks, the refractive index range is at such a breadth that challenges current experimental fabrication. In this work, we propose two new kinds of logarithm conformal mappings for invisible device designs. For one of the mappings, the refractive index distribution of conformal cloak varies from 0 to 9.839, which is more feasible for future implementation. Numerical simulations by using finite element method are performed to confirm the theoretical analysis.
在过去几年中，自从变换光学出现以来，隐形斗篷就一直被广泛讨论。一般来说，隐形斗篷的电磁参数是复杂的张量，难以实现。作为变换光学的一种特殊方法，共形映射帮助我们用具有折射率分布的各向同性材料设计隐形斗篷。然而，对于所有已提出的各向同性斗篷，折射率范围如此之宽，对当前的实验制造构成了挑战。在这项工作中，我们提出了两种用于隐形器件设计的新型对数共形映射。对于其中一种映射，共形斗篷的折射率分布从0变化到9.839，这对于未来的实现更可行。通过使用有限元方法进行了数值模拟，以证实理论分析。
