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通过硅掺杂实现碳化硼的稳定化。

Stabilization of boron carbide via silicon doping.

作者信息

Proctor J E, Bhakhri V, Hao R, Prior T J, Scheler T, Gregoryanz E, Chhowalla M, Giulani F

机构信息

Department of Physics and Mathematics, University of Hull, Hull HU6 7RX,UK. Joule Physics Laboratory, School of Computing, Science and Engineering, University of Salford, Manchester M5 4WT, UK.

出版信息

J Phys Condens Matter. 2015 Jan 14;27(1):015401. doi: 10.1088/0953-8984/27/1/015401. Epub 2014 Nov 27.

Abstract

Boron carbide is one of the lightest and hardest ceramics, but its applications are limited by its poor stability against a partial phase separation into separate boron and carbon. Phase separation is observed under high non-hydrostatic stress (both static and dynamic), resulting in amorphization. The phase separation is thought to occur in just one of the many naturally occurring polytypes in the material, and this raises the possibility of doping the boron carbide to eliminate this polytype. In this work, we have synthesized boron carbide doped with silicon. We have conducted a series of characterizations (transmission electron microscopy, scanning electron microscopy, Raman spectroscopy and x-ray diffraction) on pure and silicon-doped boron carbide following static compression to 50 GPa non-hydrostatic pressure. We find that the level of amorphization under static non-hydrostatic pressure is drastically reduced by the silicon doping.

摘要

碳化硼是最轻且最硬的陶瓷材料之一,但其应用受到限制,因为它在部分相分离成单独的硼和碳时稳定性较差。在高非静水压力(包括静态和动态)下会观察到相分离,导致非晶化。人们认为相分离仅发生在该材料众多天然存在的多型体中的一种,这就增加了对碳化硼进行掺杂以消除这种多型体的可能性。在这项工作中,我们合成了掺硅的碳化硼。在将纯碳化硼和掺硅碳化硼静态压缩至50吉帕的非静水压力后,我们对其进行了一系列表征(透射电子显微镜、扫描电子显微镜、拉曼光谱和X射线衍射)。我们发现,通过硅掺杂,静态非静水压力下的非晶化程度大幅降低。

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