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通过压光电效应优化硅基 p-n 结光电探测器的性能。

Optimizing performance of silicon-based p-n junction photodetectors by the piezo-phototronic effect.

机构信息

School of Materials Science and Engineering, Georgia Institute of Technology , Atlanta, Georgia 30332-0245, United States.

出版信息

ACS Nano. 2014 Dec 23;8(12):12866-73. doi: 10.1021/nn506427p. Epub 2014 Dec 8.

Abstract

Silicon-based p-n junction photodetectors (PDs) play an essential role in optoelectronic applications for photosensing due to their outstanding compatibility with well-developed integrated circuit technology. The piezo-phototronic effect, a three-way coupling effect among semiconductor properties, piezoelectric polarizations, and photon excitation, has been demonstrated as an effective approach to tune/modulate the generation, separation, and recombination of photogenerated electron-hole pairs during optoelectronic processes in piezoelectric-semiconductor materials. Here, we utilize the strain-induced piezo-polarization charges in a piezoelectric n-ZnO layer to modulate the optoelectronic process initiated in a p-Si layer and thus optimize the performances of p-Si/ZnO NWs hybridized photodetectors for visible sensing via tuning the transport property of charge carriers across the Si/ZnO heterojunction interface. The maximum photoresponsivity R of 7.1 A/W and fastest rising time of 101 ms were obtained from these PDs when applying an external compressive strain of -0.10‰ on the ZnO NWs, corresponding to relative enhancement of 177% in R and shortening to 87% in response time, respectively. These results indicate a promising method to enhance/optimize the performances of non-piezoelectric semiconductor material (e.g., Si) based optoelectronic devices by the piezo-phototronic effect.

摘要

基于硅的 p-n 结光电探测器(PD)由于其与成熟的集成电路技术的出色兼容性,在光电应用中的光传感中起着至关重要的作用。压电 - 光电效应是半导体性质、压电极化和光子激发之间的三向耦合效应,已被证明是一种有效的方法,可以在压电半导体材料中的光电过程中调节/调制光生电子-空穴对的产生、分离和复合。在这里,我们利用压电 n-ZnO 层中的应变诱导压电极化电荷来调制在 p-Si 层中引发的光电过程,从而通过调节电荷载流子在 Si/ZnO 异质结界面的输运性质来优化 p-Si/ZnO NWs 混合光电探测器在可见光感应中的性能。当在 ZnO NWs 上施加-0.10‰的外部压缩应变时,这些 PD 的最大光响应率 R 为 7.1 A/W,最快上升时间为 101 ms,分别对应于 R 的相对增强 177%和响应时间缩短 87%。这些结果表明,通过压电 - 光电效应增强/优化基于非压电半导体材料(例如 Si)的光电设备性能的一种很有前途的方法。

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