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通过准分子激光退火对氧化钇稳定氧化锆外延薄膜性能的改性。

Modification of properties of yttria stabilized zirconia epitaxial thin films by excimer laser annealing.

作者信息

Bayati R, Molaei R, Richmond A, Nori S, Wu F, Kumar D, Narayan J, Reynolds J G, Reynolds C L

机构信息

Intel Corporation , IMO-RA, Hillsboro, Oregon 97124, United States.

出版信息

ACS Appl Mater Interfaces. 2014 Dec 24;6(24):22316-25. doi: 10.1021/am506298y. Epub 2014 Dec 4.

Abstract

This study focuses on the ultrafast improvement of surface wettability, electrical, and room temperature magnetic characteristics of cubic zirconia single crystalline thin films after laser annealing. The point defects generated by the laser treatment are envisaged to play a critical role in altering the above properties. Yttria stabilized zirconia (YSZ) thin films were epitaxially grown on Si(100) substrates by pulsed laser deposition technique and subsequently annealed by a KrF excimer laser beam (τ = 25 ns) using low-energy laser pulses. An atomically sharp interface, parallel to the film free surface, between laser annealed layer and the pristine region was observed. The single crystalline nature of thin films was preserved following the laser treatment. The laser-solid interaction with YSZ led to the introduction of point defects, i.e., oxygen vacancies, resulting in a strained structure which, in turn, resulted in the formation of a tetragonal-like zirconia. With the increase of number of laser pulses the laser treated films got highly disordered due to the high concentration of the point defects, while maintaining their crystalline nature. Although the surface of the pristine sample showed weak hydrophilic characteristics (contact angle ∼ 73°), the laser annealed samples exhibited significantly improved hydrophilic characteristics. It was found that there is an optimum number of laser pulses where the maximum hydrophilicity (contact angle ∼ 22°) is obtained. The carrier concentration in the sample with the highest hydrophilicity was determined to be higher by about 5 orders of magnitude compared to the pristine sample. This sample possessed the lowest electrical resistivity. The laser annealed YSZ epilayers showed a superior room-temperature ferromagnetic behavior, compared to the pristine samples. A 2-fold enhancement in the magnetization of the samples was observed following the laser treatment which is a clear demonstration of the key role of defects and their transient distribution throughout the lattice. All these observations were correlated with the formation of point defects due to the photon interaction with YSZ and absorption of energy of the KrF laser photons to produce defects.

摘要

本研究聚焦于激光退火后立方氧化锆单晶薄膜表面润湿性、电学及室温磁特性的超快改善。设想激光处理产生的点缺陷在改变上述特性方面起关键作用。采用脉冲激光沉积技术在Si(100)衬底上外延生长氧化钇稳定氧化锆(YSZ)薄膜,随后用低能量的KrF准分子激光束(脉宽τ = 25 ns)进行退火处理。观察到激光退火层与原始区域之间存在一个与薄膜自由表面平行的原子级尖锐界面。激光处理后薄膜的单晶性质得以保留。激光与YSZ的相互作用导致引入点缺陷,即氧空位,从而形成应变结构,进而形成类似四方相的氧化锆。随着激光脉冲数的增加,由于点缺陷浓度高,激光处理后的薄膜变得高度无序,但仍保持其晶体性质。尽管原始样品表面表现出较弱的亲水性(接触角约为73°),但激光退火后的样品亲水性显著改善。发现存在一个最佳激光脉冲数,此时可获得最大亲水性(接触角约为22°)。与原始样品相比,亲水性最高的样品中的载流子浓度被确定高出约5个数量级。该样品具有最低的电阻率。与原始样品相比,激光退火的YSZ外延层表现出优异的室温铁磁行为。激光处理后观察到样品的磁化强度增强了2倍,这清楚地证明了缺陷及其在整个晶格中的瞬态分布所起的关键作用。所有这些观察结果都与光子与YSZ相互作用以及KrF激光光子能量吸收产生缺陷从而形成点缺陷相关。

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