Shi Yuechun, Li Simin, Chen Xiangfei, Li Lianyan, Li Jingsi, Zhang Tingting, Zheng Jilin, Zhang Yunshan, Tang Song, Hou Lianping, Marsh John H, Qiu Bocang
National Laboratory of Solid State Microstructures, College of Engineering and Applied Sciences, Microwave-Photonics Technology Laboratory, Nanjing University, Nanjing, 210093, China.
1] National Laboratory of Solid State Microstructures, College of Engineering and Applied Sciences, Microwave-Photonics Technology Laboratory, Nanjing University, Nanjing, 210093, China [2] School of Engineering, University of Glasgow, Glasgow G12 8QQ, U.K.
Sci Rep. 2014 Dec 9;4:7377. doi: 10.1038/srep07377.
Multi-wavelength semiconductor laser arrays (MLAs) have wide applications in wavelength multiplexing division (WDM) networks. In spite of their tremendous potential, adoption of the MLA has been hampered by a number of issues, particularly wavelength precision and fabrication cost. In this paper, we report high channel count MLAs in which the wavelengths of each channel can be determined precisely through low-cost standard μm-level photolithography/holographic lithography and the reconstruction-equivalent-chirp (REC) technique. 60-wavelength MLAs with good wavelength spacing uniformity have been demonstrated experimentally, in which nearly 83% lasers are within a wavelength deviation of ±0.20 nm, corresponding to a tolerance of ±0.032 nm in the period pitch. As a result of employing the equivalent phase shift technique, the single longitudinal mode (SLM) yield is nearly 100%, while the theoretical yield of standard DFB lasers is only around 33.3%.
多波长半导体激光阵列（MLA）在波分复用（WDM）网络中有着广泛的应用。尽管其潜力巨大，但MLA的采用却受到诸多问题的阻碍，尤其是波长精度和制造成本。在本文中，我们报道了一种高通道数的MLA，其中每个通道的波长可以通过低成本的标准微米级光刻/全息光刻以及重构等效啁啾（REC）技术精确确定。实验证明了具有良好波长间隔均匀性的60波长MLA，其中近83%的激光器波长偏差在±0.20 nm以内，对应周期间距的公差为±0.032 nm。由于采用了等效相移技术，单纵模（SLM）产量接近100%，而标准分布反馈（DFB）激光器的理论产量仅约为33.3%。
