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Correction of absorption-edge artifacts in polychromatic X-ray tomography in a scanning electron microscope for 3D microelectronics.

作者信息

Laloum D, Printemps T, Lorut F, Bleuet P

机构信息

Université Grenoble Alpes, F-38000 Grenoble, France.

STMicroelectronics, 850 rue Jean Monnet, 38926 Crolles, France.

出版信息

Rev Sci Instrum. 2015 Jan;86(1):013703. doi: 10.1063/1.4905117.

DOI:10.1063/1.4905117
PMID:25638086
Abstract

X-ray tomography is widely used in materials science. However, X-ray scanners are often based on polychromatic radiation that creates artifacts such as dark streaks. We show this artifact is not always due to beam hardening. It may appear when scanning samples with high-Z elements inside a low-Z matrix because of the high-Z element absorption edge: X-rays whose energy is above this edge are strongly absorbed, violating the exponential decay assumption for reconstruction algorithms and generating dark streaks. A method is proposed to limit the absorption edge effect and is applied on a microelectronic case to suppress dark streaks between interconnections.

摘要

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