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金属衬底上单层和少层六方氮化硼的生长及光谱表征

Growth and spectroscopic characterization of monolayer and few-layer hexagonal boron nitride on metal substrates.

作者信息

Feigelson Boris N, Bermudez Victor M, Hite Jennifer K, Robinson Zachary R, Wheeler Virginia D, Sridhara Karthik, Hernández Sandra C

机构信息

U.S. Naval Research Laboratory, 4555 Overlook Ave., SW, Washington, DC 20375, USA.

出版信息

Nanoscale. 2015 Feb 28;7(8):3694-702. doi: 10.1039/c4nr05557h.

Abstract

Atomically thin two dimensional hexagonal boron nitride (2D h-BN) is one of the key materials in the development of new van der Waals heterostructures due to its outstanding properties including an atomically smooth surface, high thermal conductivity, high mechanical strength, chemical inertness and high electrical resistance. The development of 2D h-BN growth is still in the early stages and largely depends on rapid and accurate characterization of the grown monolayer or few layers h-BN films. This paper demonstrates a new approach to characterizing monolayer h-BN films directly on metal substrates by grazing-incidence infrared reflection absorption spectroscopy (IRRAS). Using h-BN films grown by atmospheric-pressure chemical vapor deposition on Cu and Ni substrates, two new sub-bands are found for the A2u out-of-plane stretching mode. It is shown, using both experimental and computational methods, that the lower-energy sub-band is related to 2D h-BN coupled with substrate, while the higher energy sub-band is related to decoupled (or free-standing) 2D h-BN. It is further shown that this newly-observed fine structure in the A2u mode can be used to assess, quickly and easily, the homogeneity of the h-BN-metal interface and the effects of metal surface contamination on adhesion of the layer.

摘要

原子级薄的二维六方氮化硼(2D h-BN)因其出色的性能,包括原子级光滑的表面、高导热性、高机械强度、化学惰性和高电阻,成为新型范德华异质结构发展中的关键材料之一。二维h-BN生长的发展仍处于早期阶段,很大程度上依赖于对生长的单层或几层h-BN薄膜进行快速准确的表征。本文展示了一种通过掠入射红外反射吸收光谱(IRRAS)直接在金属衬底上表征单层h-BN薄膜的新方法。利用在铜和镍衬底上通过大气压化学气相沉积生长的h-BN薄膜,在A2u面外拉伸模式中发现了两个新的子带。使用实验和计算方法表明,能量较低的子带与与衬底耦合的二维h-BN有关,而能量较高的子带与解耦(或独立)的二维h-BN有关。进一步表明,在A2u模式中新观察到的这种精细结构可用于快速轻松地评估h-BN-金属界面的均匀性以及金属表面污染对该层附着力的影响。

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