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二维材料在六方氮化硼(h-BN)上的生长。

Growth of two-dimensional materials on hexagonal boron nitride (h-BN).

机构信息

CAS Key Laboratory of Standardization and Measurement for Nanotechnology, CAS Center for Excellence in Nanoscience, National Center for Nanoscience and Technology, Beijing 100190, People's Republic of China.

出版信息

Nanotechnology. 2019 Jan 18;30(3):034003. doi: 10.1088/1361-6528/aaeb70. Epub 2018 Nov 16.

Abstract

With its atomically smooth surface yet no dangling bond, chemical inertness and high temperature sustainability, the insulating hexagonal boron nitride (h-BN) can be an ideal substrate for two-dimensional (2D) material growth and device measurement. In this review, research progress on the chemical growth of 2D materials on h-BN has been summarized, such as chemical vapor deposition and molecular beam epitaxy of graphene and various transition metal dichalcogenides. Further, stacking of the as-grown 2D materials relative to h-BN, thermal expansion matching between the deposited materials and h-BN, electrical property of 2D materials on h-BN have been discussed in detail.

摘要

具有原子级光滑表面、无悬挂键、化学惰性和高温稳定性的绝缘六方氮化硼(h-BN)可以成为二维(2D)材料生长和器件测量的理想衬底。在这篇综述中,总结了 2D 材料在 h-BN 上的化学生长研究进展,如石墨烯和各种过渡金属二卤化物的化学气相沉积和分子束外延。此外,详细讨论了所生长的 2D 材料相对于 h-BN 的堆叠、沉积材料与 h-BN 之间的热膨胀匹配以及 h-BN 上 2D 材料的电学性能。

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