Price Randi S, Dubinina Galyna, Wicks Geoffrey, Drobizhev Mikhail, Rebane Aleksander, Schanze Kirk S
†Department of Chemistry, University of Florida, Gainesville, Florida 32611, United States.
‡Department of Physics, Montana State University, Bozeman, Montana 59717, United States.
ACS Appl Mater Interfaces. 2015 May 27;7(20):10795-805. doi: 10.1021/acsami.5b01456. Epub 2015 May 15.
A series of platinum(II) acetylide complexes containing p-phenylenevinylene and moieties end-capped with triphenylamine groups have been incorporated into poly(methyl methacrylate) (PMMA) monoliths for optical power limiting applications. The one- and two-photon photophysical properties were investigated and compared to the photophysical properties in THF. The absolute two-photon absorption cross-section values for the monolith samples were measured and are comparable to the values obtained in solution. In the PMMA monoliths, the complexes retained the important two-photon absorption and reverse saturable absorption properties necessary for optical power limiting via dual mode mechanism, and their strong nonlinear absorption property was demonstrated by the open-aperture Z-scan method. Photostability studies of the p-phenylenevinylene platinum(II) acetylide complexes showed two photodegradation processes: a trans-to-cis isomerization and a singlet-oxygen sensitized self-oxidative cleavage. The photostability of the least photostable complex TPV0 was increased upon incorporation into a PMMA matrix.
一系列含有对苯撑乙烯撑和三苯胺基团封端部分的铂（II）乙炔配合物已被引入聚甲基丙烯酸甲酯（PMMA）整体材料中，用于光限幅应用。研究了其单光子和双光子光物理性质，并与在四氢呋喃中的光物理性质进行了比较。测量了整体材料样品的绝对双光子吸收截面值，这些值与在溶液中获得的值相当。在PMMA整体材料中，这些配合物保留了通过双模式机制实现光限幅所需的重要双光子吸收和反饱和吸收特性，并且通过开孔Z扫描法证明了它们强大的非线性吸收特性。对苯撑乙烯撑铂（II）乙炔配合物的光稳定性研究表明存在两种光降解过程：反式到顺式异构化和单线态氧敏化的自氧化裂解。将最不稳定的配合物TPV0掺入PMMA基质后，其光稳定性有所提高。
