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AlInGaN的均匀性与组成:一项多探针纳米结构研究。

Homogeneity and composition of AlInGaN: A multiprobe nanostructure study.

作者信息

Krause Florian F, Ahl Jan-Philipp, Tytko Darius, Choi Pyuck-Pa, Egoavil Ricardo, Schowalter Marco, Mehrtens Thorsten, Müller-Caspary Knut, Verbeeck Johan, Raabe Dierk, Hertkorn Joachim, Engl Karl, Rosenauer Andreas

机构信息

Institut für Festkörperphysik, Universität Bremen, Otto-Hahn-Allee 1, 28359 Bremen, Germany.

OSRAM Opto Semiconductors GmbH, Leibnizstr. 4, 93055 Regensburg, Germany.

出版信息

Ultramicroscopy. 2015 Sep;156:29-36. doi: 10.1016/j.ultramic.2015.04.012. Epub 2015 Apr 25.

Abstract

The electronic properties of quaternary AlInGaN devices significantly depend on the homogeneity of the alloy. The identification of compositional fluctuations or verification of random-alloy distribution is hence of grave importance. Here, a comprehensive multiprobe study of composition and compositional homogeneity is presented, investigating AlInGaN layers with indium concentrations ranging from 0 to 17at% and aluminium concentrations between 0 and 39 at% employing high-angle annular dark field scanning electron microscopy (HAADF STEM), energy dispersive X-ray spectroscopy (EDX) and atom probe tomography (APT). EDX mappings reveal distributions of local concentrations which are in good agreement with random alloy atomic distributions. This was hence investigated with HAADF STEM by comparison with theoretical random alloy expectations using statistical tests. To validate the performance of these tests, HAADF STEM image simulations were carried out for the case of a random-alloy distribution of atoms and for the case of In-rich clusters with nanometer dimensions. The investigated samples, which were grown by metal-organic vapor phase epitaxy (MOVPE), were thereby found to be homogeneous on this nanometer scale. Analysis of reconstructions obtained from APT measurements yielded matching results. Though HAADF STEM only allows for the reduction of possible combinations of indium and aluminium concentrations to the proximity of isolines in the two-dimensional composition space. The observed ranges of composition are in good agreement with the EDX and APT results within the respective precisions.

摘要

四元AlInGaN器件的电学性质显著依赖于合金的均匀性。因此,识别成分波动或验证随机合金分布至关重要。本文提出了一项关于成分和成分均匀性的综合多探针研究,采用高角度环形暗场扫描电子显微镜(HAADF STEM)、能量色散X射线光谱(EDX)和原子探针断层扫描(APT),研究铟浓度范围为0至17at%、铝浓度范围为0至39at%的AlInGaN层。EDX映射揭示了局部浓度分布,其与随机合金原子分布高度吻合。因此,通过使用统计测试与理论随机合金预期进行比较,利用HAADF STEM对此进行了研究。为了验证这些测试的性能,针对原子随机合金分布情况以及具有纳米尺寸的富铟团簇情况进行了HAADF STEM图像模拟。结果发现,通过金属有机气相外延(MOVPE)生长的研究样品在该纳米尺度上是均匀的。对从APT测量获得的重构进行分析得到了匹配结果。虽然HAADF STEM仅允许将铟和铝浓度的可能组合减少到二维成分空间中等值线附近。在各自的精度范围内,观察到的成分范围与EDX和APT结果高度吻合。

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