使用纳米压印光刻胶模板对具有亚 15nm 间隔线图案的聚(2-乙烯基吡啶)-b-聚苯乙烯-b-聚(2-乙烯基吡啶)三嵌段共聚物进行定向自组装。
Directed Self-Assembly of Poly(2-vinylpyridine)-b-polystyrene-b-poly(2-vinylpyridine) Triblock Copolymer with Sub-15 nm Spacing Line Patterns Using a Nanoimprinted Photoresist Template.
机构信息
Department of Polymer Science and Engineering, University of Massachusetts Amherst, 120 Governors Drive, Amherst, MA, 01003, USA.
College of Materials Science and Engineering, Lanzhou University of Technology, Lanzhou, 730050, Gansu, China.
出版信息
Adv Mater. 2015 Aug 5;27(29):4364-70. doi: 10.1002/adma.201501585. Epub 2015 Jun 18.
Low molecular weight P2VP-b-PS-b-P2VP triblock copolymer (poly(2-vinlypyridine)-block-polystyrene-block-poly(2-vinylpyridine)] is doped with copper chloride and microphase separated into lamellar line patterns with ultrahigh area density. Salt-doped P2VP-b-PS-b-P2VP triblock copolymer is self-assembled on the top of the nanoimprinted photoresist template, and metallic nanowires with long-range ordering are prepared with platinum-salt infiltration and plasma etching.
低分子量 P2VP-b-PS-b-P2VP 三嵌段共聚物（聚（2-乙烯基吡啶）-嵌段-聚苯乙烯-嵌段-聚（2-乙烯基吡啶）]）被氯化铜掺杂，并微相分离成具有超高面积密度的层状线图案。盐掺杂的 P2VP-b-PS-b-P2VP 三嵌段共聚物在纳米压印光刻胶模板的顶部自组装，并用铂盐渗透和等离子体蚀刻制备具有长程有序的金属纳米线。
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