Wan Weiwei, Ponsetto Joseph Louis, Liu Zhaowei
Opt Express. 2015 Jul 13;23(14):18501-10. doi: 10.1364/OE.23.018501.
The development of nanostructured metamaterials and the ability to engineer material dispersion has led to impressive advances in the diverse field of nanophotonics. Of interest to many is the enhanced ability to control, illuminate, and image with light on subwavelength scales. In this letter, we numerically demonstrate a hyperlens with unprecedented radial-resolution at 5 nm scale for both imaging and lithography applications. Both processes are shown to have accuracy that surpasses the Abbe diffraction limit in the radial direction, which has potential applications for 3D imaging and lithography. Design optimization is discussed with regards to several important hyperlens parameters.
纳米结构超材料的发展以及对材料色散进行调控的能力，已在纳米光子学的各个领域取得了令人瞩目的进展。许多人感兴趣的是在亚波长尺度上增强用光进行控制、照明和成像的能力。在本信函中，我们通过数值模拟展示了一种超透镜，其在5纳米尺度下用于成像和光刻应用时具有前所未有的径向分辨率。这两个过程在径向方向上的精度均显示超过了阿贝衍射极限，在3D成像和光刻方面具有潜在应用。针对几个重要的超透镜参数讨论了设计优化问题。
