Wu Jiahao, Amirsadeghi Alborz, Kim Jinsoo, Park Sunggook
J Nanosci Nanotechnol. 2015 Jan;15(1):471-4. doi: 10.1166/jnn.2015.8390.
Using a silicone or metallic stamp for imprinting multiscale patterns comprising micro down to nanoscale patterns into polymer substrates often results in significant deformation in the molded substrate and loss of pattern transfer fidelity for nanopatterns. In the worst case, the expensive stamp can also be damaged. One method to reduce the problem is to use polymer as the stamp material, which will reduce both adhesion and thermal stress generated at the stamp/substrate interface. In this paper, stamps made of three different polymer materials, i.e., polydimethylsiloxane (PDMS), PPGDA-based UV resin and TPGDA-based UV-resin, were fabricated from the same master containing nanofluidic structures and the replication fidelity from the master, polymer stamps, to thermal-imprinted poly(methyl methacrylate) substrate (PMMA) was compared. The largest loss of pattern fidelity occurs in the thermal imprinting step. Polymer stamps with higher Young's moduli result in a better fidelity in pattern transfer. With TPGDA-based UV resin stamps, multiscale structures with a nanochannel with minimum width and height of -70 nm can be imprinted onto PMMA substrate together with macro-scale patterns by a single nanoimprinting processes.
使用硅树脂或金属印章将包含从微米到纳米尺度图案的多尺度图案压印到聚合物基板中，通常会导致模制基板出现显著变形，并导致纳米图案的图案转移保真度降低。在最坏的情况下，昂贵的印章也可能会损坏。一种减少该问题的方法是使用聚合物作为印章材料，这将减少在印章/基板界面处产生的附着力和热应力。在本文中，由三种不同聚合物材料制成的印章，即聚二甲基硅氧烷（PDMS）、基于PPGDA的紫外光树脂和基于TPGDA的紫外光树脂，是由包含纳米流体结构的同一个母版制作而成的，并比较了从母版、聚合物印章到热压印聚甲基丙烯酸甲酯基板（PMMA）的复制保真度。图案保真度的最大损失发生在热压印步骤中。杨氏模量较高的聚合物印章在图案转移方面具有更好的保真度。使用基于TPGDA的紫外光树脂印章，通过单次纳米压印工艺，可以将具有最小宽度和高度为-70nm的纳米通道的多尺度结构与宏观图案一起压印到PMMA基板上。
