National Institute of Advanced Industrial Science and Technology (AIST), 2266-98 Shimoshidami, Moriyama-ku, Nagoya 463-8560, Japan.
Ultrason Sonochem. 2016 Mar;29:604-11. doi: 10.1016/j.ultsonch.2015.09.011. Epub 2015 Sep 24.
This paper describes the sizes of cleaned areas under different sonication conditions with the addition of flowing micrometer-sized air bubbles. The differences in the cleaned area of a glass plate pasted with silicon grease as a dirty material under different sonication conditions were investigated after tiny bubbles were blown on the dirty plate placed in an underwater sound field. The ultrasound was applied perpendicular to the bubble flow direction. The shape of the cleaned areas was nearly elliptical, so the lengths of the minor and major axes were measured. The length of the minor axis under sweep conditions (amplitude modulation), for which the average power was lower than that for continuous wave (CW) irradiation, was comparable to that for CW irradiation and was slightly larger than under bubble flow only. Not only the relatively high power for CW irradiation, but also the larger angular change of the bubble flow direction under sweep conditions contributed to the enlargement of the cleaned area in the direction of the minor axis. The combination of bubble flow and sonication under sweep or CW conditions produced a larger cleaned area compared with bubble flow only, although the increase was not higher than 20%. A rapid change from an air to water interface caused by the bubble flow and water jets caused by the collapse of bubbles due to violent pulsation is the main cleaning mechanism under a combination of ultrasound and bubble flow.
本文描述了在添加流动的微米级气泡的情况下,不同超声条件下清洁区域的大小。将微小气泡吹到放置在水下声场中的脏污板上后,研究了在不同超声条件下,粘贴硅脂的玻璃板的清洁面积的差异,作为脏污材料。超声波垂直于气泡流动方向施加。清洁区域的形状几乎为椭圆形,因此测量了短轴和长轴的长度。在扫频条件(调幅)下,由于平均功率低于连续波(CW)照射,短轴的长度与 CW 照射相当,略大于仅气泡流的情况。不仅 CW 照射的相对高功率,而且扫频条件下气泡流方向的较大角度变化也有助于沿短轴方向扩大清洁区域。与仅气泡流相比,扫频或 CW 条件下的气泡流和超声组合产生了更大的清洁区域,尽管增加幅度不高于 20%。由于气泡流引起的空气到水界面的快速变化以及由于剧烈脉动而导致的气泡破裂引起的水流,是超声和气泡流组合下的主要清洁机制。