Balcaen Lieve, Bolea-Fernandez Eduardo, Resano Martín, Vanhaecke Frank
Ghent University, Department of Analytical Chemistry, Krijgslaan 281-S12, B-9000 Ghent, Belgium.
University of Zaragoza, Department of Analytical Chemistry, Pedro Cerbuna 12, E-50009 Zaragoza, Spain.
Anal Chim Acta. 2015 Sep 24;894:7-19. doi: 10.1016/j.aca.2015.08.053. Epub 2015 Sep 3.
This paper is intended as a tutorial review on the use of inductively coupled plasma - tandem mass spectrometry (ICP-MS/MS) for the interference-free quantitative determination and isotope ratio analysis of metals and metalloids in different sample types. Attention is devoted both to the instrumentation and to some specific tools and procedures available for advanced method development. Next to the more typical reaction gases, e.g., H2, O2 and NH3, also the use of promising alternative gases, such as CH3F, is covered, and the possible reaction pathways with those reactive gases are discussed. A variety of published applications relying on the use of ICP-MS/MS are described, to illustrate the added value of tandem mass spectrometry in (ultra)trace analysis.
本文旨在对电感耦合等离子体串联质谱(ICP-MS/MS)用于不同样品类型中金属和类金属的无干扰定量测定及同位素比值分析进行教程式综述。文中既关注了仪器设备,也涉及了一些可用于高级方法开发的特定工具和程序。除了更典型的反应气体,如H2、O2和NH3,还涵盖了有前景的替代气体(如CH3F)的使用,并讨论了与这些反应性气体可能的反应途径。描述了各种依赖ICP-MS/MS使用的已发表应用,以说明串联质谱在(超)痕量分析中的附加价值。