Mitchson Gavin, Falmbigl Matthias, Ditto Jeffrey, Johnson David C
Chemistry Department and Materials Science Institute, University of Oregon , 1253 University of Oregon, Eugene, Oregon 97403-1253, United States.
Inorg Chem. 2015 Nov 2;54(21):10309-15. doi: 10.1021/acs.inorgchem.5b01648. Epub 2015 Oct 14.
(BiSe)(1+δ)NbSe2 ferecrystals were synthesized in order to determine whether structural modulation in BiSe layers, characterized by periodic antiphase boundaries and Bi-Bi bonding, occurs. Specular X-ray diffraction revealed the formation of the desired compound with a c-axis lattice parameter of 1.21 nm from precursors with a range of initial compositions and initial periodicities. In-plane X-ray diffraction scans could be indexed as hk0 reflections of the constituents, with a rectangular basal BiSe lattice and a trigonal basal NbSe2 lattice. Electron micrographs showed extensive turbostratic disorder in the samples and the presence of periodic antiphase boundaries (approximately 1.5 nm periodicity) in BiSe layers oriented with the [110] direction parallel to the zone axis of the microscope. This indicates that the structural modulation in the BiSe layers is not due to coherency strain resulting from commensurate in-plane lattices. Electrical transport measurements indicate that holes are the dominant charge carrying species, that there is a weak decrease in resistivity as temperature decreases, and that minimal charge transfer occurs from the BiSe to NbSe2 layers. This is consistent with the lack of charge transfer from the BiX to the TX2 layers reported in misfit layer compounds where antiphase boundaries were observed. This suggests that electronic considerations, i.e., localization of electrons in the Bi-Bi pairs at the antiphase boundaries, play a dominant role in stabilizing the structural modulation.
合成了(BiSe)(1+δ)NbSe2铁电晶体,以确定在BiSe层中是否会出现以周期性反相边界和Bi-Bi键为特征的结构调制。镜面X射线衍射显示,从具有一系列初始组成和初始周期性的前驱体中形成了所需的化合物,其c轴晶格参数为1.21 nm。面内X射线衍射扫描可以索引为成分的hk0反射,具有矩形基底BiSe晶格和三角基底NbSe2晶格。电子显微镜照片显示样品中存在广泛的层错无序,并且在BiSe层中存在周期性反相边界(周期性约为1.5 nm),其[110]方向平行于显微镜的晶带轴。这表明BiSe层中的结构调制不是由于面内晶格匹配产生的相干应变。电输运测量表明,空穴是主要的载流子,随着温度降低,电阻率略有下降,并且从BiSe层到NbSe2层的电荷转移极少。这与在观察到反相边界的错配层化合物中报道的从BiX层到TX2层缺乏电荷转移一致。这表明电子因素,即在反相边界处Bi-Bi对中的电子局域化,在稳定结构调制中起主导作用。