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YVO4:Eu荧光纳米材料的合成及其在潜在指纹显影中的应用

[Synthesis of YVO4 : Eu Fluorescent Nanomaterials and Their Applications in Development of Latent Fingerprints].

作者信息

Wang Meng

出版信息

Guang Pu Xue Yu Guang Pu Fen Xi. 2015 Jun;35(6):1601-5.

PMID:26601375
Abstract

YVO4 : Eu fluorescent nanomaterials with small size and strong fluorescent intensity were synthesized via a hydrothermal method by using polyethylenimine (PEI) as the modifier, and the reaction mechanism of this synthesis was also discussed. The as-synthesized nanomaterials were characterized through transmission electron microscopy (TEM), X-ray diffraction (XRD) measurements, Fourier transform infrared (FT-IR) spectroscopy and fluorescence spectroscopy (FS). The as-prepared fluorescent nanomaterials were well-dispersed and spherical in shape with an average diameter of about 30 nm, which were modified with a layer of PEI on surfaces. The fluorescent nanomaterials were of pure tetragonal YVO4 structure. They could emit strong red fluorescence under the 254 nm ultraviolet excitation. The YVO4 : Eu fluorescent dry powders were then used as a novel fluorescent label for the development of latent fingerprints on various smooth substrates. Furthermore, the sensitivity and the resistance to background interference in fingerprint development were investigated in detail. The results showed that, use of YVO4 : Eu fluorescent nanomaterials to develop latent fingerprints resulted in clearly defined friction ridge details of fingerprints and eliminated background interference under 254 nm ultraviolet light. Compared with the traditionally used fluorescent developing powders, our YVO4 : Eu fluorescent nanomaterials were a novel agent for latent fingerprint development with high sensitivity, high contrast, and low background interference.

摘要

以聚乙烯亚胺(PEI)为改性剂,通过水热法合成了尺寸小、荧光强度强的YVO4:Eu荧光纳米材料,并探讨了该合成方法的反应机理。通过透射电子显微镜(TEM)、X射线衍射(XRD)测量、傅里叶变换红外(FT-IR)光谱和荧光光谱(FS)对合成的纳米材料进行了表征。所制备的荧光纳米材料分散良好,呈球形,平均直径约为30nm,表面包覆有一层PEI。荧光纳米材料具有纯四方YVO4结构。在254nm紫外光激发下,它们能发出强烈的红色荧光。然后,将YVO4:Eu荧光干粉用作一种新型荧光标记物,用于在各种光滑基质上显现潜在指纹。此外,还详细研究了指纹显现中的灵敏度和抗背景干扰能力。结果表明,使用YVO4:Eu荧光纳米材料显现潜在指纹,在254nm紫外光下指纹的摩擦嵴细节清晰,消除了背景干扰。与传统使用的荧光显影粉相比,我们的YVO4:Eu荧光纳米材料是一种新型的潜在指纹显现剂,具有高灵敏度、高对比度和低背景干扰。

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