Choo Dong Chul, Lee Jun Gyu, Kim Tae Whan
J Nanosci Nanotechnol. 2015 Oct;15(10):7598-601. doi: 10.1166/jnn.2015.11134.
Poly(methyl methacrylate) (PMMA) substrates containing silver nanowires (Ag NWs) were fabricated by using a transfer method. Ag NWs with a length of 20 μm and a width of 80 nm were synthesized by using a modified polyol process. Ag NW electrodes with a high surface roughness value on glass substrates were significantly improved by using both a transfer method and a poly(3,4-ethylenedioxythiophene):polystyrene sulfonate layer coating. The peak-to-valley roughness of the Ag NWs decreased from 210 to 26 nm resulting from the filling of the PMMA into the vacancies among the Ag NWs, and the corresponding root-mean-square roughness decreased from 74 to 6 nm. Atomic force microscopy images showed a dramatic decrease in the surface roughness of the PMMA substrates containing Ag NWs. The optical transmittance and the sheet resistance of the optimized Ag NW-embedded PMMA substrates were 80% and 14 Ω/sq, respectively.
采用转移法制备了含银纳米线(Ag NWs)的聚甲基丙烯酸甲酯(PMMA)基底。通过改进的多元醇法合成了长度为20μm、宽度为80nm的Ag NWs。通过转移法和聚(3,4-乙撑二氧噻吩):聚苯乙烯磺酸盐层涂层,显著改善了玻璃基底上具有高表面粗糙度值的Ag NW电极。由于PMMA填充到Ag NWs之间的空位中,Ag NWs的峰谷粗糙度从210nm降至26nm,相应的均方根粗糙度从74nm降至6nm。原子力显微镜图像显示含Ag NWs的PMMA基底的表面粗糙度显著降低。优化后的嵌入Ag NW的PMMA基底的光学透过率和方阻分别为80%和14Ω/sq。