Department of Materials Science and Engineering, National Tsing Hua University , No. 101, Section 2, Kuang-Fu Road, Hsinchu 30013, Taiwan Republic of China.
ACS Appl Mater Interfaces. 2016 Feb;8(7):4624-32. doi: 10.1021/acsami.5b11151. Epub 2016 Feb 9.
We developed an innovative approach of self-biased sputtering solid doping source process to synthesize doped crystalline Si film on flexible polyimide (PI) substrate via microwave-plasma-enhanced chemical vapor deposition (MWPECVD) using SiCl4/H2 mixture. In this process, P dopants or B dopants were introduced by sputtering the solid doping target through charged-ion bombardment in situ during high-density microwave plasma deposition. A strong correlation between the number of solid doping targets and the characteristics of doped Si films was investigated in detail. The results show that both P- and B-doped crystalline Si films possessed a dense columnar structure, and the crystallinity of these structures decreased with increasing the number of solid doping targets. The films also exhibited a high growth rate (>4.0 nm/s). Under optimal conditions, the maximum conductivity and corresponding carrier concentration were, respectively, 9.48 S/cm and 1.2 × 10(20) cm(-3) for P-doped Si film and 7.83 S/cm and 1.5 × 10(20) cm(-3) for B-doped Si film. Such high values indicate that the incorporation of dopant with high doping efficiency (around 40%) into the Si films was achieved regardless of solid doping sources used. Furthermore, a flexible crystalline Si film solar cell with substrate configuration was fabricated by using the structure of PI/Mo film/n-type Si film/i-type Si film/p-type Si film/ITO film/Al grid film. The best solar cell performance was obtained with an open-circuit voltage of 0.54 V, short-circuit current density of 19.18 mA/cm(2), fill factor of 0.65, and high energy conversion of 6.75%. According to the results of bending tests, the critical radius of curvature (RC) was 12.4 mm, and the loss of efficiency was less than 1% after the cyclic bending test for 100 cycles at RC, indicating superior flexibility and bending durability. These results represent important steps toward a low-cost approach to high-performance flexible crystalline Si film-based photovoltaic devices.
我们开发了一种创新的自偏置溅射固体掺杂源工艺,通过微波等离子体增强化学气相沉积(MWPECVD)在柔性聚酰亚胺(PI)衬底上合成掺杂晶体硅薄膜,使用 SiCl4/H2 混合物。在该工艺中,通过在高密度微波等离子体沉积过程中通过带电离子轰击原位溅射固体掺杂靶,引入 P 掺杂剂或 B 掺杂剂。详细研究了固体掺杂靶数量与掺杂 Si 薄膜特性之间的强相关性。结果表明,P 掺杂和 B 掺杂的晶体硅薄膜均具有致密的柱状结构,这些结构的结晶度随固体掺杂靶数量的增加而降低。这些薄膜还表现出高生长速率(>4.0nm/s)。在最佳条件下,P 掺杂 Si 薄膜的最大电导率和相应的载流子浓度分别为 9.48S/cm 和 1.2×10(20)cm(-3),B 掺杂 Si 薄膜的最大电导率和相应的载流子浓度分别为 7.83S/cm 和 1.5×10(20)cm(-3)。如此高的值表明,无论使用何种固体掺杂源,都可以将掺杂效率(约 40%)较高的掺杂剂掺入 Si 薄膜中。此外,通过使用 PI/Mo 膜/n 型 Si 膜/i 型 Si 膜/p 型 Si 膜/ITO 膜/Al 栅格膜的结构,制造了具有衬底配置的柔性晶体硅薄膜太阳能电池。最佳太阳能电池性能的开路电压为 0.54V,短路电流密度为 19.18mA/cm(2),填充因子为 0.65,能量转换效率为 6.75%。根据弯曲测试结果,临界曲率半径(RC)为 12.4mm,在 RC 下循环弯曲 100 次后,效率损失小于 1%,表明其具有优异的柔韧性和弯曲耐久性。这些结果代表了低成本实现高性能柔性晶体硅薄膜基光伏器件的重要步骤。