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巯基功能聚合物的受激辐射损耗光刻技术

Stimulated Emission Depletion Lithography with Mercapto-Functional Polymers.

作者信息

Buchegger Bianca, Kreutzer Johannes, Plochberger Birgit, Wollhofen Richard, Sivun Dmitry, Jacak Jaroslaw, Schütz Gerhard J, Schubert Ulrich, Klar Thomas A

机构信息

Institute of Applied Physics, Johannes Kepler University Linz , Altenberger Straße 69, 4040 Linz, Austria.

Institute of Materials Chemistry, TU Wien , Getreidemarkt 9, 1060 Vienna, Austria.

出版信息

ACS Nano. 2016 Feb 23;10(2):1954-9. doi: 10.1021/acsnano.5b05863. Epub 2016 Feb 10.

Abstract

Surface reactive nanostructures were fabricated using stimulated emission depletion (STED) lithography. The functionalization of the nanostructures was realized by copolymerization of a bifunctional metal oxo cluster in the presence of a triacrylate monomer. Ligands of the cluster surface cross-link to the monomer during the lithographic process, whereas unreacted mercapto functionalized ligands are transferred to the polymer and remain reactive after polymer formation of the surface of the nanostructure. The depletion efficiency in dependence of the cluster loading was investigated and full depletion of the STED effect was observed with a cluster loading exceeding 4 wt %. A feature size by λ/11 was achieved by using a donut-shaped depletion beam. The reactivity of the mercapto groups on the surface of the nanostructure was tested by incubation with mercapto-reactive fluorophores.

摘要

利用受激发射损耗(STED)光刻技术制备了表面反应性纳米结构。通过在三丙烯酸酯单体存在下使双功能金属氧簇共聚,实现了纳米结构的功能化。在光刻过程中,簇表面的配体与单体交联,而未反应的巯基官能化配体转移到聚合物上,并在纳米结构表面形成聚合物后仍保持反应活性。研究了依赖于簇负载量的损耗效率,当簇负载量超过4 wt%时,观察到STED效应的完全损耗。通过使用环形损耗光束,实现了λ/11的特征尺寸。通过与巯基反应性荧光团孵育,测试了纳米结构表面巯基的反应活性。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/8411/4768287/cdf638ae46aa/nn-2015-05863w_0002.jpg

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