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NLO下衰变过程中红外发散的处理技术及其在顶夸克衰变中的应用。

Techniques for the treatment of IR divergences in decay processes at NLO and application to the top-quark decay.

作者信息

Basso Lorenzo, Dittmaier Stefan, Huss Alexander, Oggero Luisa

机构信息

Physikalisches Institut, Albert-Ludwigs-Universität Freiburg, 79104 Freiburg, Germany ; IPHC, Université de Strasbourg, 23 rue du Loess, 67037 Strasbourg, France ; UMR7178, CNRS, 67037 Strasbourg, France.

Physikalisches Institut, Albert-Ludwigs-Universität Freiburg, 79104 Freiburg, Germany.

出版信息

Eur Phys J C Part Fields. 2016;76(2):56. doi: 10.1140/epjc/s10052-016-3878-2. Epub 2016 Jan 30.

DOI:10.1140/epjc/s10052-016-3878-2
PMID:26900344
原文链接:https://pmc.ncbi.nlm.nih.gov/articles/PMC4750460/
Abstract

We present the extension of two general algorithms for the treatment of infrared singularities arising in electroweak corrections to decay processes at next-to-leading order: the dipole subtraction formalism and the one-cutoff slicing method. The former is extended to the case of decay kinematics which has not been considered in the literature so far. The latter is generalised to production and decay processes with more than two charged particles, where new "surface" terms arise. Arbitrary patterns of massive and massless external particles are considered, including the treatment of infrared singularities in dimensional or mass regularisation. As an application of the two techniques we present the calculation of the next-to-leading order QCD and electroweak corrections to the top-quark decay width including all off-shell and decay effects of intermediate [Formula: see text] bosons. The result, e.g., represents a building block of a future calculation of NLO electroweak effects to off-shell top-quark pair ([Formula: see text]) production. Moreover, this calculation can serve as the first step towards an event generator for top-quark decays at next-to-leading order accuracy, which can be used to attach top-quark decays to complicated many-particle top-quark processes, such as for [Formula: see text] or [Formula: see text].

摘要

我们展示了两种通用算法的扩展，这两种算法用于处理弱电修正到衰变过程中次领头阶出现的红外奇点：偶极子减法形式和单截断切片方法。前者被扩展到衰变运动学的情形，这是迄今文献中尚未考虑过的。后者被推广到具有多于两个带电粒子的产生和衰变过程，其中会出现新的“表面”项。考虑了有质量和无质量外部粒子的任意模式，包括在维数正则化或质量正则化中对红外奇点的处理。作为这两种技术的一个应用，我们给出了对顶夸克衰变宽度的次领头阶量子色动力学和弱电修正的计算，包括所有中间[公式：见原文]玻色子的离壳和衰变效应。例如，该结果是未来对离壳顶夸克对（[公式：见原文]）产生的次领头阶弱电效应计算的一个组成部分。此外，该计算可以作为迈向次领头阶精度的顶夸克衰变事件发生器的第一步，它可用于将顶夸克衰变附加到复杂的多粒子顶夸克过程，例如对于[公式：见原文]或[公式：见原文]。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/658a/4750460/5ac67ad45b38/10052_2016_3878_Fig8_HTML.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/658a/4750460/84ca920c86be/10052_2016_3878_Fig1_HTML.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/658a/4750460/56a496f1f59e/10052_2016_3878_Fig2_HTML.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/658a/4750460/d0eb26e15624/10052_2016_3878_Fig3_HTML.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/658a/4750460/37684cd822d7/10052_2016_3878_Fig4_HTML.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/658a/4750460/4cc53d11e980/10052_2016_3878_Fig5_HTML.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/658a/4750460/54a51aca1341/10052_2016_3878_Fig6_HTML.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/658a/4750460/f3aacb304b9b/10052_2016_3878_Fig7_HTML.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/658a/4750460/5ac67ad45b38/10052_2016_3878_Fig8_HTML.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/658a/4750460/84ca920c86be/10052_2016_3878_Fig1_HTML.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/658a/4750460/56a496f1f59e/10052_2016_3878_Fig2_HTML.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/658a/4750460/d0eb26e15624/10052_2016_3878_Fig3_HTML.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/658a/4750460/37684cd822d7/10052_2016_3878_Fig4_HTML.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/658a/4750460/4cc53d11e980/10052_2016_3878_Fig5_HTML.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/658a/4750460/54a51aca1341/10052_2016_3878_Fig6_HTML.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/658a/4750460/f3aacb304b9b/10052_2016_3878_Fig7_HTML.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/658a/4750460/5ac67ad45b38/10052_2016_3878_Fig8_HTML.jpg

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引用本文的文献

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