Kwon Do Hyun, Jin Zhenyu, Shin Seokhee, Lee Wook-Seong, Min Yo-Sep
Department of Chemical Engineering, Konkuk University, 120 Neungdong-Ro, Gwangjin-Gu, Seoul 143-701, Korea.
Electronic Materials Center, Korea Institute of Science and Technology, Seongbuk-Gu, Seoul 136-791, Korea.
Nanoscale. 2016 Apr 7;8(13):7180-8. doi: 10.1039/c5nr09065b.
Atomic layer deposition (ALD) has emerged as an efficient method to design and prepare catalysts with atomic precision. Here, we report a comprehensive study on ALD of molybdenum sulfide (MoSx) for an electrocatalytic hydrogen evolution reaction. By using molybdenum hexacarbonyl and dimethyldisulfide as the precursors of Mo and S, respectively, the MoSx catalysts are grown at 100 °C on porous carbon fiber papers (CFPs). The ALD process results in the growth of particle-like MoSx on the CFP due to the lack of adsorption sites, and its crystallographic structure is a mixture of amorphous and nano-crystalline phases. In order to unveil the intrinsic activity of the ALD-MoSx, the exchange current densities, Tafel slopes, and turnover frequencies of the catalysts grown under various ALD conditions have been investigated by considering the fractional surface coverage of MoSx on the CFP and catalytically-active surface area. In addition, the ALD-MoSx/CFP catalysts exhibit excellent catalytic stability due to the strong adhesion of MoSx on the CFP and the mixed phase.
原子层沉积（ALD）已成为一种以原子精度设计和制备催化剂的有效方法。在此，我们报告了一项关于用于电催化析氢反应的硫化钼（MoSx）原子层沉积的综合研究。通过分别使用六羰基钼和二甲基二硫作为Mo和S的前驱体，在100°C下于多孔碳纤维纸（CFP）上生长MoSx催化剂。由于缺乏吸附位点，ALD过程导致在CFP上生长出颗粒状的MoSx，其晶体结构为非晶相和纳米晶相的混合物。为了揭示ALD-MoSx的本征活性，通过考虑MoSx在CFP上的分数表面覆盖率和催化活性表面积，研究了在各种ALD条件下生长的催化剂的交换电流密度、塔菲尔斜率和周转频率。此外，由于MoSx在CFP上的强附着力和混合相，ALD-MoSx/CFP催化剂表现出优异的催化稳定性。
