Marshall Janet, Allen Richard A, McGray Craig D, Geist Jon
Semiconductor Electronics Division, National Institute of Standards and Technology, Gaithersburg, MD 20899-8120.
J Res Natl Inst Stand Technol. 2010 Oct 1;115(5):303-42. doi: 10.6028/jres.115.023. Print 2010 Sep-Oct.
This paper presents the results of a microelectromechanical systems (MEMS) Young's modulus and step height round robin experiment, completed in April 2009, which compares Young's modulus and step height measurement results at a number of laboratories. The purpose of the round robin was to provide data for the precision and bias statements of two \ related Semiconductor Equipment and Materials International (SEMI) standard test methods for MEMS. The technical basis for the test methods on Young's modulus and step height measurements are also provided in this paper. Using the same test method, the goal of the round robin was to assess the repeatability of measurements at one laboratory, by the same operator, with the same equipment, in the shortest practical period of time as well as the reproducibility of measurements with independent data sets from unique combinations of measurement setups and researchers. Both the repeatability and reproducibility measurements were done on random test structures made of the same homogeneous material. The average repeatability Young's modulus value (as obtained from resonating oxide cantilevers) was 64.2 GPa with 95 % limits of ± 10.3 % and an average combined standard uncertainty value of 3.1 GPa. The average reproducibility Young's modulus value was 62.8 GPa with 95 % limits of ± 11.0 % and an average combined standard uncertainty value of 3.0 GPa. The average repeatability step height value (for a metal2-over-poly1 step from active area to field oxide) was 0.477 μm with 95 % limits of 7.9 % and an average combined standard uncertainty value of 0.014 μm. The average reproducibility step height value was 0.481 μm with 95 % limits of ± 6.2 % and an average combined standard uncertainty value of 0.014 μm. In summary, this paper demonstrates that a reliable methodology can be used to measure Young's modulus and step height. Furthermore, a micro and nano technology (MNT) 5-in-1 standard reference material (SRM) can be used by industry to compare their in-house measurements using this methodology with NIST measurements thereby validating their use of the documentary standards.
本文介绍了2009年4月完成的一项微机电系统(MEMS)杨氏模量和台阶高度循环实验的结果,该实验比较了多个实验室的杨氏模量和台阶高度测量结果。循环实验的目的是为两项相关的半导体设备和材料国际组织(SEMI)MEMS标准测试方法的精密度和偏差声明提供数据。本文还提供了杨氏模量和台阶高度测量测试方法的技术基础。使用相同的测试方法,循环实验的目标是评估同一实验室中同一操作员使用同一设备在最短实际时间内测量的重复性,以及使用来自测量设置和研究人员独特组合的独立数据集进行测量的再现性。重复性和再现性测量均在由相同均质材料制成的随机测试结构上进行。杨氏模量的平均重复性值(由谐振氧化物悬臂梁获得)为64.2 GPa,95%置信区间为±10.3%,平均合成标准不确定度值为3.1 GPa。杨氏模量的平均再现性值为62.8 GPa,95%置信区间为±11.0%,平均合成标准不确定度值为3.0 GPa。台阶高度的平均重复性值(对于从有源区到场氧化层的金属2覆盖多晶硅1台阶)为0.477μm,95%置信区间为7.9%,平均合成标准不确定度值为0.014μm。台阶高度的平均再现性值为0.481μm,95%置信区间为±6.2%,平均合成标准不确定度值为0.014μm。总之,本文表明可以使用可靠的方法来测量杨氏模量和台阶高度。此外,行业可以使用微纳技术(MNT)五合一标准参考物质(SRM),将他们使用此方法的内部测量结果与美国国家标准与技术研究院(NIST)的测量结果进行比较,从而验证他们对文件标准的使用。