Ann Jae-Min, Bae Hack-Gun, Oh Jae-Sang, Yoon Seok-Mann
Department of Neurosurgery, Cheonan Hospital, Soonchunhyang University School of Medicine, Cheonan, Korea.
J Korean Neurosurg Soc. 2016 May;59(3):322-4. doi: 10.3340/jkns.2016.59.3.322. Epub 2016 May 10.
To introduce a new device for catheter placement of an external ventricular drain (EVD) of cerebrospinal fluid (CSF). This device was composed of three portions, T-shaped main body, rectangular pillar having a central hole to insert a catheter and an arm pointing the tragus. The main body has a role to direct a ventricular catheter toward the right or left inner canthus and has a shallow longitudinal opening to connect the rectangular pillar. The arm pointing the tragus is controlled by back and forth movement and turn of the pillar attached to the main body. Between April 2012 and December 2014, 57 emergency EVDs were performed in 52 patients using this device in the operating room. Catheter tip located in the frontal horn in 52 (91.2%), 3rd ventricle in 2 (3.5%) and in the wall of the frontal horn of the lateral ventricle in 3 EVDs (5.2%). Small hemorrhage along to catheter tract occurred in 1 EVD. CSF was well drained through the all EVD catheters. The accuracy of the catheter position and direction using this device were 91% and 100%, respectively. This device for EVD guides to provide an accurate position of catheter tip safely and easily.
介绍一种用于脑脊液(CSF)体外脑室引流(EVD)导管置入的新装置。该装置由三部分组成,T形主体、带有用于插入导管的中心孔的矩形柱以及指向耳屏的臂。主体的作用是将脑室导管引向右侧或左侧内眦,并具有一个浅的纵向开口以连接矩形柱。指向耳屏的臂通过与主体相连的柱的前后移动和转动来控制。在2012年4月至2014年12月期间,在手术室中使用该装置对52例患者进行了57次紧急EVD。导管尖端位于额叶角的有52例(91.2%),位于第三脑室的有2例(3.5%),位于侧脑室额叶角壁的有3例(5.2%)。1例EVD出现沿导管路径的小出血。所有EVD导管的脑脊液引流良好。使用该装置时导管位置和方向的准确率分别为91%和100%。这种用于EVD的导向装置能够安全、轻松地提供导管尖端的准确位置。