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使用兆伏串联加速器结合离子源二次离子质谱监测进行几keV研究的其他用途。

Alternative uses of a megavolt tandem accelerator for few-keV studies with ion-source SIMS monitoring.

作者信息

Mello S L A, Codeço C F S, Magnani B F, Sant'Anna M M

机构信息

Departamento de Física, Universidade Federal de Viçosa, 36570-900 Viçosa, MG, Brazil.

Instituto de Física, Universidade Federal do Rio de Janeiro, 21941-972 Rio de Janeiro, RJ, Brazil.

出版信息

Rev Sci Instrum. 2016 Jun;87(6):063305. doi: 10.1063/1.4953889.

DOI:10.1063/1.4953889
PMID:27370445
Abstract

We increase the versatility of a tandem electrostatic accelerator by implementing simple modifications to the standard operation procedure. While keeping its ability to deliver MeV ion beams, we show that the experimental setup can (i) provide good quality ion beams in the few-keV energy range and (ii) be used to study ion-beam surface modification with simultaneous secondary ion mass spectrometry. This latter task is accomplished without using any chamber connected to the accelerator exit. We perform mass spectrometry of the few-keV anions produced in the ion source by measuring their neutral counterparts at the accelerator exit with energies up to 1.7 MeV. With an additional modification, a high-current few-keV regime is obtained, using the ion source as an irradiation chamber and the accelerator itself only as a mass spectrometer. As an example of application, we prepare a sample for the study of ion-beam assisted dewetting of a thin Au film on a Si substrate.

摘要

我们通过对标准操作程序进行简单修改,提高了串联静电加速器的通用性。在保持其提供兆电子伏特离子束能力的同时,我们证明该实验装置能够:(i)在几keV能量范围内提供高质量离子束;(ii)用于通过同步二次离子质谱研究离子束表面改性。后一项任务是在不使用任何连接到加速器出口的腔室的情况下完成的。我们通过在加速器出口测量能量高达1.7 MeV的中性对应物,对离子源中产生的几keV阴离子进行质谱分析。通过进一步修改,利用离子源作为辐照腔室,仅将加速器本身用作质谱仪,获得了高电流几keV状态。作为应用示例,我们制备了一个样品,用于研究硅衬底上薄金膜的离子束辅助去湿。

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