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通过共振非弹性X射线散射研究外延氧化铈薄膜在可控还原和氧化过程中的电子性质。

Electronic properties of epitaxial cerium oxide films during controlled reduction and oxidation studied by resonant inelastic X-ray scattering.

作者信息

Gasperi Gabriele, Amidani Lucia, Benedetti Francesco, Boscherini Federico, Glatzel Pieter, Valeri Sergio, Luches Paola

机构信息

Dipartimento di Scienze Fisiche Informatiche e Matematiche, Università degli Studi di Modena e Reggio Emilia, Via G. Campi 213/a, 41125 Modena, Italy and Istituto Nanoscienze, Consiglio Nazionale delle Ricerche, Via G. Campi 213/a, 41125 Modena, Italy.

European Synchrotron Radiation Facility, BP 220, F-38043 Grenoble, France.

出版信息

Phys Chem Chem Phys. 2016 Jul 27;18(30):20511-7. doi: 10.1039/c6cp04407g.

Abstract

We investigated the evolution of the electronic structure of cerium oxide ultrathin epitaxial films during reduction and oxidation processes using resonant inelastic X-ray scattering at the Ce L3 absorption edge, a technique sensitive to the electronic configurations at the 4f levels and in the 5d band thanks to its high energy resolution. We used thermal treatments in high vacuum and in oxygen partial pressure to induce a controlled and reversible degree of reduction in cerium oxide ultrathin epitaxial films of different thicknesses. Two dominant spectral components contribute to the measured spectra at the different degrees of oxidation/reduction. In ultrathin films a modification of the electronic properties associated with platinum substrate proximity and with dimensionality is identified. The different electronic properties induce a higher reducibility in ultrathin films, ascribed to a decrease of the surface oxygen vacancy formation energy.

摘要

我们利用Ce L3吸收边的共振非弹性X射线散射研究了氧化铈超薄外延膜在还原和氧化过程中电子结构的演变,该技术由于其高能量分辨率,对4f能级和5d能带的电子构型敏感。我们在高真空和氧分压下进行热处理,以在不同厚度的氧化铈超薄外延膜中诱导可控且可逆的还原程度。在不同的氧化/还原程度下,两个主要的光谱成分对测量光谱有贡献。在超薄薄膜中,确定了与铂衬底接近度和维度相关的电子性质的改变。不同的电子性质导致超薄薄膜具有更高的还原性,这归因于表面氧空位形成能的降低。

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