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VO₂金红石相的选择性扫描隧道显微镜发光

Selective scanning tunneling microscope light emission from rutile phase of VO2.

作者信息

Sakai Joe, Kuwahara Masashi, Hotsuki Masaki, Katano Satoshi, Uehara Yoichi

机构信息

GREMAN, UMR 7347 CNRS/Université François Rabelais de Tours, 37200 Tours, France.

出版信息

J Phys Condens Matter. 2016 Sep 28;28(38):385002. doi: 10.1088/0953-8984/28/38/385002. Epub 2016 Jul 27.

Abstract

We observed scanning tunneling microscope light emission (STM-LE) induced by a tunneling current at the gap between an Ag tip and a VO2 thin film, in parallel to scanning tunneling spectroscopy (STS) profiles. The 34 nm thick VO2 film grown on a rutile TiO2 (0 0 1) substrate consisted of both rutile (R)- and monoclinic (M)-structure phases of a few 10 nm-sized domains at room temperature. We found that STM-LE with a certain photon energy of 2.0 eV occurs selectively from R-phase domains of VO2, while no STM-LE was observed from M-phase. The mechanism of STM-LE from R-phase VO2 was determined to be an interband transition process rather than inverse photoemission or inelastic tunneling processes.

摘要

我们观察到在银尖端与二氧化钒(VO₂)薄膜之间的间隙处,隧穿电流诱导产生的扫描隧道显微镜发光(STM-LE),同时还观察了扫描隧道谱(STS)曲线。在金红石型二氧化钛(TiO₂)(0 0 1)衬底上生长的34纳米厚的VO₂薄膜,在室温下由一些10纳米大小的金红石(R)相和单斜(M)相畴组成。我们发现,具有特定光子能量2.0电子伏特的STM-LE选择性地来自VO₂的R相畴,而从M相未观察到STM-LE。确定来自R相VO₂的STM-LE机制是带间跃迁过程,而不是逆光发射或非弹性隧穿过程。

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