Thin Film Nanomaterials Laboratory, Department of Physics, Shivaji University, Kolhapur 416 004, India; General Science and Humanities Department, Sant Gajanan Maharaj College of Engineering, Mahagaon 416 503, India.
Optoelectronics Convergence Research Center, Department of Materials Science and Engineering, Chonnam National University, 300 Yongbong-Dong, Buk-Gu, Gwangju 500-757, South Korea.
J Colloid Interface Sci. 2016 Dec 1;483:220-231. doi: 10.1016/j.jcis.2016.08.031. Epub 2016 Aug 13.
The molybdenum trioxide (MoO3) thin films have been successfully deposited onto the glass substrates using chemical spray pyrolysis (CSP) deposition technique at various substrate temperatures ranging from 300°C to 450°C with an interval of 50°C. The effect of substrate temperature on the structural, morphological, optical and gas sensing properties of MoO3 thin films has been thoroughly investigated. X-ray diffraction analysis reveals that all the films have an orthorhombic crystal structure and are polycrystalline in nature. FE-SEM micrographs depict the formation of nanobelts-like morphology. AFM study reveals that the RMS surface roughness of MoO3 thin films increases from 8.6nm to 12nm with increase in substrate temperature from 300°C to 400°C and then decreases to 11.5nm for substrate temperature of 450°C. Optical results show that the band gap of MoO3 thin films decreases from 3.92eV to 3.44eV. The selectivity studies show that the gas response of various gases varies as NH3<SO2<CO2<CO<H2S<NO2. Moreover, typical MoO3 film deposited at substrate temperature of 400°C is highly selective and sensitive for detection of NO2 gas in comparison with other gases. The maximum response of 30.5 % is obtained towards 100ppm NO2 gas concentration at an operating temperature of 200°C with response and recovery times of 20s and 160s, respectively. Finally, NO2 gas sensing mechanism model based on the chemisorption process is discussed.
三氧化钼（MoO3）薄膜已成功地使用化学喷雾热解（CSP）沉积技术沉积在玻璃基底上，基底温度范围从 300°C 到 450°C，间隔为 50°C。研究了基底温度对 MoO3 薄膜的结构、形态、光学和气体传感性能的影响。X 射线衍射分析表明，所有的薄膜都具有正交晶相结构，且为多晶态。FE-SEM 形貌图描述了纳米带的形成。原子力显微镜（AFM）研究表明，MoO3 薄膜的均方根（RMS）表面粗糙度从 300°C 到 400°C 随着基底温度的升高从 8.6nm 增加到 12nm，然后在基底温度为 450°C 时减小到 11.5nm。光学结果表明，MoO3 薄膜的带隙从 3.92eV 减小到 3.44eV。选择性研究表明，各种气体的气体响应随 NH3<SO2<CO2<CO<H2S<NO2 而变化。此外，与其他气体相比，在基底温度为 400°C 时沉积的典型 MoO3 薄膜对 NO2 气体的检测具有高选择性和敏感性。在 200°C 的工作温度下，对 100ppm 的 NO2 气体浓度的最大响应为 30.5%，响应和恢复时间分别为 20s 和 160s。最后，讨论了基于化学吸附过程的 NO2 气体传感机制模型。
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