Chatterjee Prasenjit, Chow Hwang-Cherng, Feng Wu-Shiung
Graduate Institute of Electronic Engineering, Chang Gung University, 259 Wen-Hwa 1st Road, Kwei-Shan, Tao-Yuan 333, Taiwan.
Sensors (Basel). 2016 Aug 30;16(9):1389. doi: 10.3390/s16091389.
This paper reports a detailed analysis of the drain current modulation of a single-drain normal-gate n channel metal-oxide semiconductor field effect transistor (n-MOSFET) under an on-chip magnetic field. A single-drain n-MOSFET has been fabricated and placed in the center of a square-shaped metal loop which generates the on-chip magnetic field. The proposed device designed is much smaller in size with respect to the metal loop, which ensures that the generated magnetic field is approximately uniform. The change of drain current and change of bulk current per micron device width has been measured. The result shows that the difference drain current is about 145 µA for the maximum applied magnetic field. Such changes occur from the applied Lorentz force to push out the carriers from the channel. Based on the drain current difference, the change in effective mobility has been detected up to 4.227%. Furthermore, a detailed investigation reveals that the device behavior is quite different in subthreshold and saturation region. A change of 50.24 µA bulk current has also been measured. Finally, the device has been verified for use as a magnetic sensor with sensitivity 4.084% (29.6 T(-1)), which is very effective as compared to other previously reported works for a single device.
本文报道了对片上磁场作用下单漏极正常栅n沟道金属氧化物半导体场效应晶体管(n-MOSFET)漏极电流调制的详细分析。已制作了一个单漏极n-MOSFET,并将其放置在产生片上磁场的方形金属环的中心。所设计的器件尺寸相对于金属环要小得多,这确保了所产生的磁场近似均匀。测量了每微米器件宽度的漏极电流变化和体电流变化。结果表明,对于最大施加磁场,漏极电流差约为145 μA。这种变化是由于施加的洛伦兹力将载流子从沟道中推出所致。基于漏极电流差,检测到有效迁移率变化高达4.227%。此外,详细研究表明,该器件在亚阈值和饱和区域的行为有很大不同。还测量到体电流变化为50.24 μA。最后,已验证该器件可用作磁传感器,灵敏度为4.084%(29.6 T⁻¹),与之前报道的其他单个器件相比,这是非常有效的。