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具有光学深度扫描功能的结构光照辅助微偏转测量法

Structured illumination assisted microdeflectometry with optical depth scanning capability.

作者信息

Lu Sheng-Huei, Hua Hong

出版信息

Opt Lett. 2016 Sep 1;41(17):4114-7. doi: 10.1364/OL.41.004114.

Abstract

Microdeflectometry is a powerful noncontact tool for measuring nanometer defects on a freeform surface. However, it requires a time-consuming process to take measurements at different depths for an extended depth of field (EDOF) and lacks surface information for integrating the measured gradient data to height. We propose an optical depth scanning technique to speed up the measurement process and introduce the structured illumination technique to efficiently determine the focused data among 3D observation and provide surface orientations for reconstructing an unknown surface shape. We demonstrated 3D measurements with an equivalent surface height sensitivity of 7.21 nm and an EDOF of at least 250 μm, which is 15 times that of the diffraction limited depth range.

摘要

微偏转测量法是一种用于测量自由曲面纳米级缺陷的强大非接触式工具。然而,对于扩展景深(EDOF),它需要在不同深度进行测量的耗时过程,并且缺乏用于将测量的梯度数据积分到高度的表面信息。我们提出了一种光学深度扫描技术来加速测量过程,并引入结构化照明技术,以便在三维观测中有效地确定聚焦数据,并为重建未知表面形状提供表面方向。我们展示了等效表面高度灵敏度为7.21纳米、EDOF至少为250微米的三维测量,这是衍射极限深度范围的15倍。

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