Department of Mechanical Engineering, National Kaohsiung University of Applied Sciences, Kaohsiung, 80778, Taiwan.
Nanoscale Res Lett. 2016 Dec;11(1):401. doi: 10.1186/s11671-016-1616-1. Epub 2016 Sep 15.
Mechanical properties of copper (Cu) film under grinding process were accomplished by molecular dynamics simulation. A numerical calculation was carried out to understand the distributions of atomic and slip vector inside the Cu films. In this study, the roller rotation velocity, temperature, and roller rotation direction change are investigated to clarify their effect on the deformation mechanism. The simulation results showed that the destruction of materials was increased proportionally to the roller rotation velocity. The machining process at higher temperature results in larger kinetic energy of atoms than lower temperature during the grinding process of the Cu films. The result also shows that the roller rotation in the counterclockwise direction had the better stability than the roller rotation in the clockwise direction due to significantly increased backfill atoms in the groove of the Cu film surface. Additionally, the effects of the rolling resistances on the Cu film surfaces during the grinding process are studied by the molecular dynamics simulation method.
通过分子动力学模拟研究了研磨过程中铜(Cu)薄膜的力学性能。进行了数值计算以了解 Cu 薄膜内部原子和滑移矢量的分布。在这项研究中,研究了滚轮旋转速度、温度和滚轮旋转方向的变化,以阐明它们对变形机制的影响。模拟结果表明,材料的破坏与滚轮旋转速度成正比增加。在 Cu 薄膜的研磨过程中,加工温度较高会导致原子的动能比低温时大。结果还表明,由于在 Cu 薄膜表面的凹槽中明显增加了回填原子,因此滚轮沿逆时针方向旋转比顺时针方向旋转具有更好的稳定性。此外,通过分子动力学模拟方法研究了研磨过程中滚动阻力对 Cu 薄膜表面的影响。