Guo Erjuan, Zeng Zhigang, Shi Xiaobo, Long Xiao, Wang Xiaohong
Department of Physics, College of Sciences, ‡Institute of NanoMicroEnergy, College of Science, §Shanghai Key Laboratory of High Temperature Superconductor, ∥Department of Chemistry, College of Sciences, Shanghai University , Shanghai 200444, China.
Langmuir. 2016 Oct 18;32(41):10589-10596. doi: 10.1021/acs.langmuir.6b02232. Epub 2016 Oct 4.
In this work, gold nanoparticles (Au NPs) were distributed on an n-Ge substrate using the colloidal NP deposition method to form Au NP/Ge Schottky diodes (SDs), and the current transport properties of these nano-SDs were studied. The current density-voltage (J-V) characteristics were measured on each nanometer-sized Au particle using a conducting atomic force microscope (C-AFM). These Au NP/Ge diodes showed a rectifying behavior. According to the thermionic emission (TE) model, the effective Schottky barrier height (SBH) and ideality factors n were obtained. The SBH for the Au NP/Ge diodes ranges from 0.22 to 0.30 eV and the ideality factor ranges from 3.8 to 8.6. The current density and the barrier height increase while the ideality factor decreases with increasing Au NP diameters. This indicates that the tunneling effect is enhanced because of the narrowed depletion width and decreased size of the Au NP/Ge SDs. To compare the electrical behavior with Au NP/Ge diodes, the Au thin film/Ge diodes were also prepared and their SBHs were much larger because of the image-charge lowering effect and the tunneling effect in Au NP/Ge diodes.
在本工作中,采用胶体纳米颗粒沉积法将金纳米颗粒(Au NPs)分布在n-Ge衬底上,以形成Au NP/Ge肖特基二极管(SDs),并研究了这些纳米SDs的电流传输特性。使用导电原子力显微镜(C-AFM)在每个纳米尺寸的金颗粒上测量电流密度-电压(J-V)特性。这些Au NP/Ge二极管表现出整流行为。根据热电子发射(TE)模型,获得了有效肖特基势垒高度(SBH)和理想因子n。Au NP/Ge二极管的SBH范围为0.22至0.30 eV,理想因子范围为3.8至8.6。随着Au NP直径的增加,电流密度和势垒高度增加,而理想因子减小。这表明由于Au NP/Ge SDs的耗尽宽度变窄和尺寸减小,隧穿效应增强。为了将电学行为与Au NP/Ge二极管进行比较,还制备了Au薄膜/Ge二极管,由于Au NP/Ge二极管中的镜像电荷降低效应和隧穿效应,它们的SBHs要大得多。