Gao Fei, Teplyakov Andrew V
Department of Chemistry and Biochemistry, University of Delaware, Newark, Delaware 19716, United States.
J Phys Chem C Nanomater Interfaces. 2016 May 17;120(10):5539-5548. doi: 10.1021/acs.jpcc.5b12424. Epub 2016 Feb 18.
Formation of stable organic-inorganic contacts with silicon often requires oxygen- and carbon-free interfaces. Some of the general approaches to create such interfaces rely on the formation of a Si-N bond. A reaction of dehydrohalogenation condensation of Cl-terminated Si(111) surface with phenylhydrazine is investigated as a means to introduce a simple function to the surface using a -NH-NH moiety as opposed to previously investigated approaches. The use of substituted hydrazine allows for the formation of a stable structure that is less strained compared to the previously investigated primary amines and leads to minimal surface oxidation. The process is confirmed by a combination of infrared studies, X-ray photoelectron spectroscopy, and time-of-flight secondary ion mass spectrometry investigations. Density functional theory is utilized to yield a plausible surface reaction mechanism and provide a set of experimental observables to compare with these data.
与硅形成稳定的有机-无机接触通常需要无氧和无碳界面。创建此类界面的一些通用方法依赖于Si-N键的形成。研究了Cl端接的Si(111)表面与苯肼的脱卤化氢缩合反应，以此作为一种使用-NH-NH部分向表面引入简单官能团的方法，这与之前研究的方法不同。与之前研究的伯胺相比，使用取代肼能够形成应变较小的稳定结构，并使表面氧化降至最低。通过红外研究、X射线光电子能谱和飞行时间二次离子质谱研究相结合，证实了该过程。利用密度泛函理论得出合理的表面反应机理，并提供一组实验观测值以与这些数据进行比较。
