Xiang Lanyi, Wang Wei, Xie Wenfa
State Key Laboratory on Integrated Optoelectronics, College of Electronic Science and Engineering, Jilin University, 2699 Qianjin Street, Changchun 130012, China.
Sci Rep. 2016 Nov 8;6:36291. doi: 10.1038/srep36291.
Poly(vinylidene fluoride-trifluoroethylene) has been widely used as a dielectric of the ferroelectric organic field-effect transistor (FE-OFET) nonvolatile memory (NVM). Some critical issues, including low mobility and high operation voltage, existed in these FE-OFET NVMs, should be resolved before considering to their commercial application. In this paper, we demonstrated low-voltage operating FE-OFET NVMs based on a ferroelectric terpolymer poly(vinylidene-fluoride-trifluoroethylene-chlorotrifluoroethylene) [P(VDF-TrFE-CTFE)] owed to its low coercive field. By applying an ultraviolet-ozone (UVO) treatment to modify the surface of P(VDF-TrFE-CTFE) films, the growth model of the pentacene film was changed, which improved the pentacene grain size and the interface morphology of the pentacene/P(VDF-TrFE-CTFE). Thus, the mobility of the FE-OFET was significantly improved. As a result, a high performance FE-OFET NVM, with a high mobility of 0.8 cmVs, large memory window of 15.4~19.2, good memory on/off ratio of 10, the reliable memory endurance over 100 cycles and stable memory retention ability, was achieved at a low operation voltage of ±15 V.
聚(偏二氟乙烯-三氟乙烯)已被广泛用作铁电有机场效应晶体管(FE-OFET)非易失性存储器(NVM)的电介质。在考虑将这些FE-OFET NVM商业化应用之前,需要解决一些关键问题,包括低迁移率和高工作电压。在本文中,我们展示了基于铁电三元共聚物聚(偏二氟乙烯-三氟乙烯-氯三氟乙烯)[P(VDF-TrFE-CTFE)]的低电压工作FE-OFET NVM,这得益于其低矫顽场。通过应用紫外线臭氧(UVO)处理来修饰P(VDF-TrFE-CTFE)薄膜的表面,改变了并五苯薄膜的生长模式,从而改善了并五苯晶粒尺寸以及并五苯/P(VDF-TrFE-CTFE)的界面形态。因此,FE-OFET的迁移率得到了显著提高。结果表明,在±15 V的低工作电压下,实现了高性能的FE-OFET NVM,其迁移率高达0.8 cm²V⁻¹s⁻¹,记忆窗口大,为15.4~19.2,记忆开/关比良好,为10,具有超过100次循环的可靠记忆耐久性和稳定的记忆保持能力。