State Key Laboratory on Integrated Optoelectronics, College of Electronic Science and Engineering, Jilin University, 2699 Qianjin Street, Changchun, 130012, China.
Sci Rep. 2017 Aug 21;7(1):8890. doi: 10.1038/s41598-017-09533-2.
The high operating voltage is a primary issue preventing the commercial application of the ferroelectric organic field-effect transistor (Fe-OFET) nonvolatile memory (NVM). In this work, we propose a novel route to resolve this issue by employing two ultrathin AlO interfacial layers sandwiching an ultrathin ferroelectric polymer film with a low coercive field, in the fabricated flexible Fe-OFET NVM. The operation voltage of Fe-OFET NVMs decreases with the downscaling thickness of the ferroelectric film. By inserting two ultrathin AlO interfacial layers at both sides of the ultrathin ferroelectric film, not only the gate leakage is prominently depressed but also the mobility is greatly improved. Excellent memory performances, with large mobility of 1.7 ~ 3.3 cm V s, high reliable memory switching endurance over 2700 cycles, high stable data storage retention capability over 8 × 10 s with memory on-off ratio larger than 10, are achieved at the low operating voltage of 4 V, which is the lowest value reported to data for all Fe-OFET NVMs. Simultaneously, outstanding mechanical fatigue property with the memory performances maintaining well over 7500 bending cycles at a bending radius of 5.5 mm is also achieved in our flexible FE-OFET NVM.
高操作电压是阻止铁电有机场效应晶体管(Fe-OFET)非易失性存储器(NVM)商业化的一个主要问题。在这项工作中,我们通过采用两个超薄 AlO 界面层夹在具有低矫顽场的超薄铁电聚合物薄膜中,提出了一种解决这个问题的新途径,在制造的柔性 Fe-OFET NVM 中。Fe-OFET NVM 的工作电压随着铁电薄膜厚度的缩小而降低。通过在超薄铁电薄膜的两侧插入两个超薄 AlO 界面层,不仅栅极漏电明显降低,而且迁移率也大大提高。在低工作电压 4V 下实现了优异的记忆性能,具有 1.7~3.3cmV s 的高迁移率、超过 2700 次循环的可靠记忆开关耐久性、超过 8×10 s 的高稳定数据存储保持能力,以及大于 10 的记忆开-关比,这是所有 Fe-OFET NVM 报告的数据的最低值。同时,在 5.5mm 弯曲半径下,我们的柔性 FE-OFET NVM 还具有出色的机械疲劳性能,记忆性能在超过 7500 次弯曲循环后仍保持良好。