Jaiswal Jyoti, Mourya Satyendra, Malik Gaurav, Chauhan Samta, Sanger Amit, Daipuriya Ritu, Singh Manpreet, Chandra Ramesh
Appl Opt. 2016 Oct 10;55(29):8368-8375. doi: 10.1364/AO.55.008368.
In the present work, optically thick nanostructured titanium (Ti) films of thickness ranging from ∼100 to 900 nm were deposited on a glass substrate by DC magnetron sputtering at room temperature. Microstructural and surface properties of the samples were studied by x-ray diffraction and x-ray photoelectron spectroscopy (XPS). The morphological results revealed a systematic normal grain growth mechanism with increasing thickness analyzed by a scanning electron microscope. The influence of thickness on film surface roughness has been investigated by atomic force microscopy (AFM). The optical dispersion behavior was examined by spectroscopic ellipsometry (SE) over the long wavelength range of 246-1688 nm. The experimentally observed SE parameters were theoretically fitted with Drude-Lorentz and Bruggeman effective medium approximation theory. The surface properties of the Ti film measured by XPS and AFM were further accounted for in the optical model to determine optical constants (n and k) and the obtained results are expected to be the best available for bulk Ti metal.
在本工作中，通过直流磁控溅射在室温下于玻璃衬底上沉积了厚度范围约为100至900 nm的光学厚纳米结构钛（Ti）薄膜。通过X射线衍射和X射线光电子能谱（XPS）研究了样品的微观结构和表面性质。形态学结果表明，通过扫描电子显微镜分析，随着厚度增加存在系统的正常晶粒生长机制。通过原子力显微镜（AFM）研究了厚度对薄膜表面粗糙度的影响。通过光谱椭偏仪（SE）在246 - 1688 nm的长波长范围内检查了光学色散行为。实验观察到的SE参数通过德鲁德 - 洛伦兹和布鲁格曼有效介质近似理论进行了理论拟合。在光学模型中进一步考虑了通过XPS和AFM测量的Ti薄膜的表面性质，以确定光学常数（n和k），并且预期所获得的结果对于块状Ti金属是目前可得的最佳结果。
