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用于评估铁电性的多尺度表征技术解读:以GaFeO为例。

Interpretation of multiscale characterization techniques to assess ferroelectricity: The case of GaFeO.

作者信息

Martin Simon, Baboux Nicolas, Albertini David, Gautier Brice

机构信息

Institut des Nanotechnologies de Lyon, INSA de Lyon, Université de Lyon, UMR CNRS 5270, 7, avenue Capelle, F-69621 Villeurbanne, France.

Institut des Nanotechnologies de Lyon, INSA de Lyon, Université de Lyon, UMR CNRS 5270, 7, avenue Capelle, F-69621 Villeurbanne, France.

出版信息

Ultramicroscopy. 2017 Jan;172:47-51. doi: 10.1016/j.ultramic.2016.10.012. Epub 2016 Nov 3.

Abstract

In this paper, we propose a thorough experimental procedure to assess the ferroelectricity of thin films, and apply this procedure to Pulsed Laser Deposition grown GaFeO thin films at the macroscale by means of Polarisation-Voltage hysteresis and at the nanoscale by Piezoresponse Force Microscopy. GaFeO is a serious candidate for the multiferroicity at room temperature, being ferrimagnetic and possibly ferroelectric. However, the non-ambiguous measurement of ferroelectric polarisation of such thin films remains a challenge. We show that although doped to decrease the leakage currents, the samples remain too leaky to allow any detection of a polarisation current, whereas Piezoresponse Force Microscopy images are indeed obtained in certain conditions. Nevertheless, the images obtained from scanning probe methods must be questioned in that context. This is why we propose to obtain PFM images at much higher frequencies to discriminate between artefactual images and true ferroelectric behaviour. The application of the method combined with the comparison with results obtained on a PbZrTiO sample allow to rule out the ferroelectricity of our GaFeO samples. Beyond the problem of GaFeO, our objective is to propose a method which enables to assess objectively the ferroelectricity of any leaky film.

摘要

在本文中,我们提出了一种全面的实验程序来评估薄膜的铁电性,并通过极化 - 电压滞后在宏观尺度以及通过压电响应力显微镜在纳米尺度将该程序应用于脉冲激光沉积生长的GaFeO薄膜。GaFeO是室温下多铁性的有力候选者,具有亚铁磁性且可能具有铁电性。然而,对此类薄膜铁电极化的明确测量仍然是一个挑战。我们表明,尽管进行了掺杂以降低漏电流,但样品的漏电仍然过大,以至于无法检测到任何极化电流,而在某些条件下确实获得了压电响应力显微镜图像。然而,在这种情况下,从扫描探针方法获得的图像必须受到质疑。这就是为什么我们建议在更高频率下获取压电响应力显微镜图像,以区分伪像图像和真正的铁电行为。该方法的应用以及与在PbZrTiO样品上获得的结果进行比较,使得我们能够排除GaFeO样品的铁电性。除了GaFeO的问题之外,我们的目标是提出一种能够客观评估任何漏电薄膜铁电性的方法。

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