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界面态诱导的 MoS 场效应晶体管中温度相关输运和滞后行为与锆钛酸铅铁电栅的关系。

Temperature-dependent transport and hysteretic behaviors induced by interfacial states in MoS field-effect transistors with lead-zirconate-titanate ferroelectric gating.

机构信息

Institute of Microelectronics, Tsinghua National Laboratory for Information Science and Technology (TNList), Tsinghua University, Beijing 100084, People's Republic of China.

出版信息

Nanotechnology. 2017 Jan 27;28(4):045204. doi: 10.1088/1361-6528/28/4/045204. Epub 2016 Dec 19.

Abstract

We report the temperature and gate-voltage-dependent electrical properties of lead-zirconate-titanate-gated MoS field-effect transistors (MoS-PZT FETs) within a temperature range of 300 to 380 K. The MoS transistors with PZT gating exhibit large reproducible clockwise hysteresis, which is induced by the dynamic charge-trapping/de-trapping process of interfacial states between PZT films and MoS channels under the modulation of ferroelectric polarization of PZT films. In this way, the modulation of the gate effect on the hysteresis behavior has been achieved by activating the dynamic charge-trapping/de-trapping process in the interfacial states under different V . Moreover, the temperature dependence of the current in the range of 300 to 380 K indicates thermally activated hysteretic behaviors. The hysteresis in the transfer characteristics of MoS-PZT FETs shows a simultaneous enlargement with increasing temperature, which can be attributed to the thermally sensitive dynamic trapping/de-trapping process of interfacial states.

摘要

我们报告了锆钛酸铅门控二硫化钼场效应晶体管(MoS-PZT FET)在 300 至 380 K 温度范围内的温度和栅极电压依赖性电特性。具有 PZT 门控的 MoS 晶体管表现出大的可重现的顺时针滞后,这是由 PZT 薄膜和 MoS 通道之间的界面态的动态电荷俘获/去俘获过程引起的,该过程在 PZT 薄膜的铁电极化的调制下。通过在不同的 V 下激活界面态中的动态电荷俘获/去俘获过程,以这种方式实现了栅极效应对滞后行为的调制。此外,在 300 至 380 K 温度范围内电流的温度依赖性表明存在热激活滞后行为。MoS-PZT FET 的转移特性中的滞后现象随温度的升高而同时增大,这归因于界面态的热敏感动态俘获/去俘获过程。

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