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拓扑绝缘体 BiSe 与反铁磁 NiO 近邻耦合导致的弱反局域化被抑制。

Suppressed weak antilocalization in the topological insulator BiSe proximity coupled to antiferromagnetic NiO.

机构信息

Department of Physics and Graphene Research Institute, Sejong University, Seoul 05006, Korea.

Department of Physics, Pohang University of Science and Technology, Pohang 37673, Korea.

出版信息

Nanoscale. 2017 Jan 5;9(2):844-849. doi: 10.1039/c6nr06795f.

Abstract

Time-reversal symmetry (TRS) breaking of the topological insulators (TIs) is a prerequisite to observe the quantum anomalous Hall effect (QAHE) and topological magnetoelectric effect (TME). Although antiferromagnetism as well as ferromagnetism could break the TRS and generate massive Dirac surface states in the TIs, no attention has been paid to the antiferromagnet-TI heterostructures. Herein, we report the magnetotransport measurements of BiSe proximately coupled to antiferromagnetic NiO. Thin films of BiSe were successfully grown on the NiO (001) single crystalline substrates by molecular beam epitaxy. Unexpectedly, we observed a strong suppression of the weak antilocalization effect, which is similar to the case of TIs coupled to the ferromagnetic materials. For the 5 nm-thick BiSe sample on NiO, we even observed a crossover to weak localization at 2 K. These behaviors are attributed to the strong magnetic exchange field from the Ni 3d electrons. Our results show the effectiveness of the antiferromagnetic materials in breaking the TRS of TIs by the proximity effect and their possible applications for QAHE and TME observations.

摘要

时间反转对称性(TRS)的破缺是拓扑绝缘体(TI)中观察量子反常霍尔效应(QAHE)和拓扑磁电效应(TME)的前提条件。尽管反铁磁以及铁磁都可以破缺 TRS 并在 TI 中产生大量的狄拉克表面态,但人们对反铁磁-TI 异质结构还没有给予关注。在这里,我们报告了 BiSe 与反铁磁 NiO 近邻耦合的输运测量结果。通过分子束外延法,我们成功地在 NiO(001)单晶衬底上生长了 BiSe 薄膜。出人意料的是,我们观察到弱反局域效应的强烈抑制,这与 TI 与铁磁材料耦合的情况类似。对于厚度为 5nm 的 BiSe 在 NiO 上的样品,我们甚至在 2K 时观察到了向弱局域的转变。这些行为归因于 Ni3d 电子的强交换磁场。我们的结果表明,通过近邻效应,反铁磁材料在破缺 TI 的 TRS 方面是有效的,它们可能在 QAHE 和 TME 的观察中得到应用。

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