Goto Tetsuya, Sato Kei-Ichiro, Yabuta Yuki, Sugawa Shigetoshi
New Industry Creation Hatchery Center, Tohoku University, Sendai 980-8579, Japan.
Kotec Co., Ltd., Iidabashi, Chiyoda, 102-0072 Tokyo, Japan.
Rev Sci Instrum. 2016 Dec;87(12):123508. doi: 10.1063/1.4972294.
A mirror-field confined compact electron cyclotron resonance (ECR) plasma source using permanent magnets was developed, aiming for the realization of high-quality plasma processings where high-density reactive species are supplied to a substrate with minimizing the ion bombardment damages. The ECR position was located between a microwave transmissive window and a quartz limiter, and plasmas were transported from the ECR position to a midplane of the magnetic mirror field through the quartz limiter. Thus, a radius of core plasma could be determined by the limiter, which was 15 mm in this study. Plasma parameters were investigated by the Langmuir probe measurement. High-density plasma larger than 10 cm could be produced by applying 5.85-GHz microwave power of 10 W or more. For the outside region of the core plasma where a wafer for plasma processings will be set at, the ion current density was decreased dramatically with distance from the core plasma and became smaller by approximately two orders of magnitude that in the core plasma region for the radial position of 40 mm, suggesting the realization of reduction in ion bombardment damages.
开发了一种使用永久磁铁的镜场约束紧凑型电子回旋共振（ECR）等离子体源，旨在实现高质量的等离子体处理，即在向衬底供应高密度反应性物种的同时，将离子轰击损伤降至最低。ECR位置位于微波透射窗口和石英限制器之间，等离子体通过石英限制器从ECR位置传输到磁镜场的中平面。因此，核心等离子体的半径可由限制器确定，本研究中该半径为15毫米。通过朗缪尔探针测量研究了等离子体参数。通过施加10 W或更高的5.85 GHz微波功率，可以产生大于10 cm的高密度等离子体。对于将设置用于等离子体处理的晶圆的核心等离子体外部区域，离子电流密度随着与核心等离子体距离的增加而急剧下降，在径向位置为40 mm时，离子电流密度比核心等离子体区域小约两个数量级，这表明实现了离子轰击损伤的降低。
