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图案化B-N掺杂诱导锡烯中带隙的打开。

Band gap opening in stanene induced by patterned B-N doping.

作者信息

Garg Priyanka, Choudhuri Indrani, Mahata Arup, Pathak Biswarup

机构信息

Discipline of Chemistry, Indian Institute of Technology (IIT) Indore, Indore, M.P. 453552, India.

出版信息

Phys Chem Chem Phys. 2017 Feb 1;19(5):3660-3669. doi: 10.1039/c6cp07505c.

DOI:10.1039/c6cp07505c
PMID:28094366
Abstract

Stanene is a quantum spin Hall insulator and a promising material for electronic and optoelectronic devices. Density functional theory (DFT) calculations are performed to study the band gap opening in stanene by elemental mono-doping (B, N) and co-doping (B-N). Different patterned B-N co-doping is studied to change the electronic properties of stanene. A patterned B-N co-doping opens the band gap in stanene and its semiconducting nature persists under strain. Molecular dynamics (MD) simulations are performed to confirm the thermal stability of such a doped system. The stress-strain study indicates that such a doped system is as stable as pure stanene. Our work function calculations show that stanene and doped stanene have a lower work function than graphene and thus are promising materials for photocatalysts and electronic devices.

摘要

锡烯是一种量子自旋霍尔绝缘体,是用于电子和光电器件的有前景的材料。进行密度泛函理论(DFT)计算以研究通过元素单掺杂(B、N)和共掺杂(B-N)在锡烯中打开带隙的情况。研究了不同图案化的B-N共掺杂以改变锡烯的电子性质。图案化的B-N共掺杂在锡烯中打开了带隙,并且其半导体性质在应变下持续存在。进行分子动力学(MD)模拟以确认这种掺杂系统的热稳定性。应力-应变研究表明,这种掺杂系统与纯锡烯一样稳定。我们的功函数计算表明,锡烯和掺杂锡烯的功函数比石墨烯低,因此是用于光催化剂和电子器件的有前景的材料。

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